journal article·2011-09

Plasma ion assisted deposition of aluminium oxide and aluminium oxifluoride layers for applications in the ultraviolet spectral range

O. Stenzel, D. Gäbler, S. Wilbrandt, N. Kaiser, H. Steffen, A. Ohl

Optical Materials· Volume 33· Issue 11
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Abstract

Abstract We present extended experimental material about optical and mechanical properties as well as the water content of aluminium oxide films, deposited by plasma ion assisted electron beam evaporation. A clear correlation between these experimental data is established and understood as being affected by the different degree of the porosity of the films. When adding fluorine as a reactive gas during deposition, aluminium oxifluoride layers can be obtained that appear nearly free of water, and combine UV-transparency with higher UV refractive indices than porous aluminium oxide layers.
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Research context

OpenAlex topics: Semiconductor materials and devices · ZnO doping and properties · Optical Coatings and Gratings

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