An ultra-broadband metasurface perfect absorber based on the triple Mie resonances

Abstract We report on an ultra-broadband metasurface perfect absorber in the visible and NIR region based on the triple Mie resonances generated from the three sets of nanopillars grown on SiO2 substrate. The polarization-independent and wide-angular-insensitive (up to 70°) high absorption is realized within a surface layer that is only 284 nm thick. Double-beam UV interference lithography and followed sputter coating depositions are utilized to efficiently fabricate the proposed metasurface structures. Experimental results demonstrate that the average absorption is 0.961 (0.970 in simulation) at the wavelength band ranging from 400 nm to 1800 nm, and works well even the incident angle is large as 70°. The demonstrated device suggests an efficient way of designing and fabricating ultra-broadband perfect absorber with metasurface structures, which has huge application prospects in advanced nanophotonic devices and integrated photonic systems.