The high refractive index of Gd2O3 thin films obtained by magnetron sputtering
Source abstract
Abstract
Abstract Gadolinium oxide (Gd2O3) thin films on a silica glass substrate were synthesized by magnetron sputtering technique. The described synthesis mode allows to obtain the films with a high uniformity in thickness. The spectral dependence of the refractive index as well as quantitative characteristics of dispersion in the range of 370–800 nm has been determined by the spectroscopic method based on the study of interference effects in the region of the film optical transparency. The peculiarity of the studied Gd2O3 films is that it is characterized by high values of the refractive index ( n = 2.15 − 2.28 ) in comparison with similar films obtained by other technologies. This opens up new possibilities for creating effective antireflection coatings and components of planar waveguides.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Semiconductor materials and devices · Optical Coatings and Gratings · Thin-Film Transistor Technologies
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References (18)
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