journal article·2008-01

Investigation of biaxial stresses in diamond films deposited on a silicon substrate by the HF CVD method

G.W. Bąk, K. Fabisiak, L. Klimek, M. Kozanecki, E. Staryga

Optical Materials· Volume 30· Issue 5
Publisher page

Abstract

Abstract The results of investigations into on composition and biaxial stress in polycrystalline diamond films deposited on silicon substrates are presented. The diamond films’ characteristics were carried out using Raman spectroscopy and Electron back-scattered diffraction. The results indicate that, apart from the dominating crystalline diamond phase inside the grains, an amount of disordered phase exists among the grains. No evidence of such diamond polymorphs as lonsdalite and graphite has been detected in the investigated films.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Diamond and Carbon-based Materials Research · High-pressure geophysics and materials · Metal and Thin Film Mechanics

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References (13)

Show source-provided references
1. Wilkinson · Micron · 1997 · 28 · 27910.1016/S0968-4328(97)00032-2 ↗
2. Klimek · J. Alloy. Compd. · 2004 · 382 · 1710.1016/j.jallcom.2004.06.012 ↗
3. Chen · Diam. Relat. Mater. · 2003 · 12 · 163310.1016/S0925-9635(03)00187-0 ↗
4. Schreck · Diam. Relat. Mat. · 2002 · 11 · 48710.1016/S0925-9635(01)00546-5 ↗
5. Mao · Mater. Sci. Technol. · 2005 · 21 · 138310.1179/174328405X71567 ↗
6. Su · Diam. Relat. Mater. · 2005 · 14 · 175310.1016/j.diamond.2005.05.005 ↗
7. Fabisiak · Funct. Mater. · 2003 · 10 · 117
8. 1998 · 413
9. Jung · Diam. Relat. Mater. · 2003 · 12 · 137310.1016/S0925-9635(03)00110-9 ↗
10. Sails · Diam. Relat. Mater. · 1996 · 5 · 58910.1016/0925-9635(96)90031-X ↗
11. Windischmann · Diam. Relat. Mater. · 1995 · 4 · 83710.1016/0925-9635(94)05327-8 ↗
12. Ager · Phys. Rev. B · 1993 · 48 · 260110.1103/PhysRevB.48.2601 ↗
13. Ralchenko · Diam. Relat. Mater. · 1995 · 4 · 75410.1016/0925-9635(94)05299-9 ↗