Removal of aqueous arsenic (III) by graphene-based systems at micro-trace level

Adsorption of arsenic by graphene-based adsorbents is widely applied to remove arsenic from water and has become a promising technology. However, most of the reported studies were conducted at a relatively higher concentration of arsenic in As (V) oxidative form, whereas the As (III) is more difficult to remove from water and more toxic, which prompted us to conduct the study at a lower concentration of 1 ppm in As (III). A Facile and controlled synthesis of graphene-based metal/metal oxide nanomaterials and adsorptive removal of aqueous As (III) is reported here. Adsorbents were characterized using spectroscopy (FTIR, XPS and Raman) and microscopy (TEM). The maximum uptake of arsenic obtained was 88.8% from the RGO-Fe3O4 composite among all the adsorbents. The pseudo-second-order model and Intra-particle mass transfer diffusion model were applied to determine the adsorption kinetics with varying contact time between the adsorbents and the As (III) in water to interact. Experimental results suggest that the adsorption of As (III) onto the adsorbents was a multi-step process involving external adsorption to the surface followed by diffusion to the interior. A simple spectrophotometric method also was used for the detection and quantification of As (III).