Highly stretchable graphene nanoribbon springs by programmable nanowire lithography

Abstract Graphene nanoribbons are ideal candidates to serve as highly conductive, flexible, and transparent interconnections, or the active channels for nanoelectronics. However, patterning narrow graphene nanoribbons to <100 nm wide usually requires inefficient micro/nano fabrication processes, which are hard to implement for large area or flexible electronic and sensory applications. Here, we develop a precise and scalable nanowire lithography technology that enables reliable batch manufacturing of ultra-long graphene nanoribbon arrays with programmable geometry and narrow width down to ~50 nm. The orderly graphene nanoribbons are patterned out of few-layer graphene sheets by using ultra-long silicon nanowires as masks, which are produced via in-plane solid–liquid–solid guided growth and then transferred reliably onto various stiff or flexible substrates. More importantly, the geometry of the graphene nanoribbons can be predesigned and engineered into elastic two-dimensional springs to achieve outstanding stretchability of >30%, while carrying stable and repeatable electronic transport. We suggest that this convenient scalable nanowire lithography technology has great potential to establish a general and efficient strategy to batch-pattern or integrate various two-dimensional materials as active channels and interconnections for emerging flexible electronic applications.