Capacitors tweak the leak
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Abstract
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Research context
OpenAlex topics: Advanced Memory and Neural Computing · Semiconductor materials and devices · Low-power high-performance VLSI design
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References (1)
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1. Kim, S.K. et al. Al-doped TiO2 films with ultralow leakage currents for next generation DRAM capacitors. Adv. Mater. 20, 1429–1435 (2008).10.1002/adma.200701085 ↗