Nanoporous Metal–Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics
Source abstract
Abstract
Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal-organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Metal-Organic Frameworks: Synthesis and Applications · Catalytic Processes in Materials Science · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Chemistry and Materials Science, Aalto University, Aalto FI-00076, Finland
Centre for Membrane Separations, Adsorption, Catalysis and Spectroscopy, Katholieke Universiteit Leuven, Leuven 3001, Belgium
Funding
H2020 Marie Sklodowska-Curie Actions · Fonds Wetenschappelijk Onderzoek · Academy of Finland
References (32)
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