Two-dimensional hard masks push three-dimensional patterning
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OpenAlex topics: Optical Coatings and Gratings · Plasma Diagnostics and Applications · Nanowire Synthesis and Applications
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References (6)
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1. Hoang, J. et al. Enabling merged 3D NAND memory hole and interlayer dielectric (ILD) contact etches with deposition and etch co-optimization (DECO). In Proc. 2025 IEEE International Memory Workshop https://doi.org/10.1109/IMW61990.2025.11026958 (IEEE, 2025).10.1109/IMW61990.2025.11026958 ↗
2. Venkatram, P. et al. Nat. Mater. https://doi.org/10.1038/s41563-026-02524-7 (2026).10.1038/s41563-026-02524-7 ↗
3. Banerjee, R. et al. Nanoscale 17, 5472–5480 (2025).10.1039/D4NR03715D ↗
4. Nguyen, V. T. H. et al. J. Vac. Sci. Technol. B 39, 032201 (2021).10.1116/6.0000922 ↗
5. Ha, D. et al. 3D stacked FET (3DSFET) logic and SRAM technology featuring single diffusion break (SDB) and back side interconnect (BSI) at 48 nm CPP for advanced mobile and high performance computing (HPC) applications. In 2025 Symposium on VLSI Technology and Circuits https://doi.org/10.23919/VLSITechnologyandCir65189.2025.11074874 (IEEE, 2025).10.23919/VLSITechnologyandCir65189.2025.11074874 ↗
6. Ahn, S. J. et al. Future technology outlook on DRAM/flash memories for more Moore and more than Moore. In 2025 IEEE International Memory Workshop https://doi.org/10.1109/IMW61990.2025.11026954 (IEEE, 2025).10.1109/IMW61990.2025.11026954 ↗