journal article·2003-11-01

Self-assembly of functional nanostructures from ABC triblock copolymers

Sabine Ludwigs, Alexander Böker, Andrej Voronov, Nicolaus Rehse, Robert Magerle, Georg Krausch

Nature Materials· Volume 2· Issue 11
Publisher page

Abstract

The spontaneous formation of nanostructured materials by molecular self-assembly of block copolymers is an active area of research, driven both by its inherent beauty and by a wealth of potential technological applications. Thin films of block copolymers have attracted increasing interest, particularly in view of possible applications in nanotechnology. Although much of the work has concentrated on block copolymers consisting of two components, the insertion of a third block greatly enlarges the structural diversity and allows incorporation of additional chemical functionality. Here we describe a highly ordered hexagonally perforated lamella structure based on an ABC triblock copolymer thin film. By suitable choice of the three blocks a versatile structure is formed. The perforated lamella can serve as a lithographic mask, it can be chemically converted into an amphiphilic structure without losing its order, and after selective removal of one of its constituents it could be used as a responsive membrane. Intriguingly, the particular choice of the blocks ensures that the structure is formed irrespective of the chemical nature of the solid substrate. The experimental results are supported by mesoscale computer simulations.
Source: europepmc · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Block Copolymer Self-Assembly · Anodic Oxide Films and Nanostructures · Surface and Thin Film Phenomena

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (26)

Show source-provided references
1. Bates, F.S. & Fredrickson, G.H. Block copolymer thermodynamics: theory and experiment. Annu. Rev. Phys. Chem. 41, 525–557 (1990).10.1146/annurev.pc.41.100190.002521 ↗
2. Klok, H.A. & Lecommandoux, S. Supramolecular materials via block copolymer self-assembly. Adv. Mater. 13, 1217–1229 (2001).10.1002/1521-4095(200108)13:16<1217::AID-ADMA1217>3.0.CO;2-D ↗
3. Adrington, A.C. et al. Polymer-based photonic crystals. Adv. Mater. 13, 421–425 (2001).10.1002/1521-4095(200103)13:6<421::AID-ADMA421>3.0.CO;2-# ↗
4. Bockstaller, M., Kolb, R. & Thomas, E.L. Metallodielectric photonic crystals based on diblock copolymers. Adv. Mater. 13, 1783–1786 (2001).10.1002/1521-4095(200112)13:23<1783::AID-ADMA1783>3.0.CO;2-X ↗
5. Mansky, P., Chaikin, P. & Thomas, E.L. Monolayer films of diblock copolymer microdomains for nanolithographic applications. J. Mater. Sci. 30, 1987–1992 (1995).10.1007/BF00353023 ↗
6. Park, M. et al. Block copolymer lithography: Periodic arrays of similar to 10(11) holes in 1 square centimeter. Science 276, 1401–1404 (1997).10.1126/science.276.5317.1401 ↗
7. Cheng, J.Y. et al. Formation of a cobalt magnetic dot array via block copolymer lithography. Adv. Mater. 13, 1174–1178 (2001).10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO;2-Q ↗
8. Jeoung, E. et al. Fabrication and characterization of nanoelectrode arrays formed via block copolymer self-assembly. Langmuir 17, 6396–6398 (2001).10.1021/la010531g ↗
9. Kim, H.-C. et al. A route to nanoscopic SiO2 posts via block copolymer templates. Adv. Mater. 13, 795–797 (2001).10.1002/1521-4095(200106)13:11<795::AID-ADMA795>3.0.CO;2-1 ↗
10. Bates, F.S. & Frederickson, G.H. Block copolymers: designer soft materials. Phys. Today. 52, 32–38 (1999).10.1063/1.882522 ↗
11. Krausch, G. & Magerle, R. Nanostructured thin films via self-assembly of block copolymers. Adv. Mater. 14, 1579–1583 (2002).10.1002/1521-4095(20021104)14:21<1579::AID-ADMA1579>3.0.CO;2-6 ↗
12. Mansky, P. et al. Controlling polymer-surface interactions with random copolymer brushes. Science 275, 1458–1460 (1997).10.1126/science.275.5305.1458 ↗
13. Thurn-Albrecht, T. et al. Overcoming interfacial interactions with electric fields. Macromolecules 33, 3250–3253 (2000).10.1021/ma991896z ↗
14. Thurn-Albrecht, T. et al. Ultrahigh-density nanowire arrays grown in self-assembled diblock copolymer templates. Science 290, 2126–2129 (2000).10.1126/science.290.5499.2126 ↗
15. Giebeler, E. & Stadler, R. ABC triblock polyampholytes containing a neutral hydrophobic block, a polyacid and a polybase. Macromol. Chem. Phys. 198, 3815–3825 (1997).10.1002/macp.1997.021981204 ↗
16. Ludwigs, S. et al. Phase behavior of linear polystyrene-block-poly(2-vinylpyridine)-block-poly(tert-butyl methacrylate) triblock copolymers. Polymer 44, 6815–6823 (2003).10.1016/j.polymer.2003.07.001 ↗
17. Magerle, R. Nanotomography. Phys. Rev. Lett. 85, 2749–2752 (2000).10.1103/PhysRevLett.85.2749 ↗
18. Hajduk, D.A. et al. Stability of the perforated layer (PL) phase in diblock copolymer melts. Macromolecules 30, 3788–3795 (1997).10.1021/ma961673y ↗
19. Knoll, A. et al. Phase behavior in thin films of cylinder-forming block copolymers. Phys. Rev. Lett. 89, 035501 (2002).10.1103/PhysRevLett.89.035501 ↗
20. Huinink, H.P. et al. Asymmetric block copolymers confined in a thin film. J. Chem. Phys. 112, 2452–2462 (2000).10.1063/1.480811 ↗
21. Tassin, J.F. et al. Kinetics of adsorption of block copolymers revealed by surface plasmons. J. Phys. Chem. 93, 2106–2111 (1989).10.1021/j100342a078 ↗
22. Fraaije, J.G.E.M. Dynamic density-functional theory for microphase separation kinetics of block-copolymer melts. J. Chem. Phys. 99, 9202–9212 (1993).10.1063/1.465536 ↗
23. Fraaije, J.G.E.M. et al. The dynamic mean-field density functional method and its application to the mesoscopic dynamics of quenched block copolymer. J. Chem. Phys. 106, 4260–4269 (1997).10.1063/1.473129 ↗
24. Sevink, G.J.A. et al. Dynamics of surface directed mesophase formation in block copolymer melts. J. Chem. Phys. 110, 2250–2256 (1999).10.1063/1.477837 ↗
25. Segalman, R.A., Yokoyama, H. & Kramer, E.J. Graphoepitaxy of spherical domain block copolymer films. Adv. Mater. 13, 1152–1155 (2001).10.1002/1521-4095(200108)13:15<1152::AID-ADMA1152>3.0.CO;2-5 ↗
26. Kim, G. & Libera, M. Morphological development in solvent-cast polystyrene-polybutadiene-polystyrene (SBS) triblock copolymer thin films. Macromolecules 31, 2569–2577 (1998).10.1021/ma971349i ↗