journal article·2018-04-27

Selective Fabrication of Mott-Insulating and Metallic Monolayer TaSe2

Yuki Nakata, Takuya Yoshizawa, Katsuaki Sugawara, Yuki Umemoto, Takashi Takahashi, Takafumi Sato

ACS Applied Nano Materials· Volume 1· Issue 4
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Abstract

We report the selective fabrication of monolayer TaSe2 with trigonal-prismatic (1H) or octahedral (1T) crystal structure on bilayer graphene by the molecular-beam-epitaxy method. By angle-resolved photoemission spectroscopy, we found that monolayer 1H-TaSe2 shows a metallic electronic structure with a dispersive band across the Fermi level (EF) similar to the bulk crystal, while monolayer 1T-TaSe2 has a sizable energy gap at EF indicative of the insulating nature in contrast to the metallic nature of bulk 1T-TaSe2. We discuss the origin and implications of differences in the electronic structure among monolayer and bulk TaSe2 by comparing the experimental results with first-principles band-structure calculations as well as previous studies on bulk TaSe2.
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Research context

OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Graphene research and applications

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Affiliations

Department of Physics, Tohoku University, Sendai 980-8578, Japan

Funding

Ministry of Education, Culture, Sports, Science and Technology · Sumitomo Foundation · Tohoku University · Japan Society for the Promotion of Science · Iketani Science and Technology Foundation

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