Floating-gate memristor based on a MoS2/h-BN/AuNPs mixed-dimensional heterostructure
Source abstract
Abstract
Abstract Memristors have recently received substantial attention because of their promising and unique emerging applications in neuromorphic computing, which can achieve gains in computation speed by mimicking the topology of the brain in electronic circuits. Traditional memristors made of bulk MoO3 and HfO2, for example, suffer from a low switching ratio and poor durability and stability. In this work, a floating-gate memristor is developed based on a mixed-dimensional heterostructure comprising two-dimensional (2D) molybdenum disulfide (MoS2) and zero-dimensional (0D) Au nanoparticles (AuNPs) separated by an insulating hexagonal boron nitride (h-BN) layer (MoS2/h-BN/AuNPs). We find that under the modulation of back-gate voltages, the MoS2/h-BN/AuNPs device operates reliably between a high-resistance state (HRS) and a low-resistance state (LRS) and shows multiple stable LRS states, demonstrating the excellent potential of our memristor in multibit storage applications. The modulation effect can be attributed to electron quantum tunneling between the AuNP charge-trapping layer and the MoS2 channel. Our memristor exhibits excellent durability and stability: the HRS and LRS are retained for more than 104 s without obvious degradation and the on/off ratio is >104 after more than 3000 switching cycles. We also demonstrate frequency-dependent memory properties upon stimulation with electrical and optical pulses.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Advanced Memory and Neural Computing · 2D Materials and Applications · Ferroelectric and Negative Capacitance Devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (53)
Show source-provided references
1. Wu · IEEE Trans. Knowl. Data Eng. · 2014 · 26 · 9710.1109/TKDE.2013.109 ↗
2. Prezioso · Nature · 2015 · 521 · 6110.1038/nature14441 ↗
3. Frank · Solid State Electron. · 2002 · 46 · 31510.1016/S0038-1101(01)00102-2 ↗
4. Sleva · IEEE Trans. Electron Devices · 2005 · 52 · 281410.1109/Ted.2005.859614 ↗
5. Neumann · IEEE Ann. Hist. Comput. · 1993 · 15 · 2710.1109/85.238389 ↗
6. Bullmore · Nat. Rev. Neurosci. · 2012 · 13 · 33610.1038/nrn3214 ↗
7. Chen · Nano Lett. · 2013 · 13 · 367110.1021/nl4015638 ↗
8. Türel · Int. J. Circuit Theory Appl. · 2003 · 31 · 3710.1002/cta.223 ↗
9. Chanthbouala · Nat. Mater. · 2012 · 11 · 86010.1038/nmat3415 ↗
10. Qian · ACS Appl. Mater. Interfaces · 2016 · 810.1021/acsami.6b08866 ↗
11. Yang · Adv. Mater. · 2018 · 3010.1002/adma.201801548 ↗
12. Miao · Adv. Mater. · 2011 · 23 · 563310.1002/adma.201103379 ↗
13. Jo · Nano Lett. · 2010 · 10 · 129710.1021/nl904092h ↗
14. Lee · Nat. Mater. · 2011 · 10 · 62510.1038/nmat3070 ↗
15. Pathak · Physica E · 2022 · 13910.1016/j.physe.2022.115157 ↗
16. Khan · Mater. Today Adv. · 2023 · 2010.1016/j.mtadv.2023.100438 ↗
17. Ghosh · J. Electron. Mater. · 2023 · 52 · 684010.1007/s11664-023-10637-x ↗
18. Wang · Nanoscale · 2016 · 810.1039/c6nr00476h ↗
19. Wedig · Nat. Nanotechnol. · 2016 · 11 · 6710.1038/nnano.2015.221 ↗
20. Liang · ACS Appl. Mater. Interfaces · 2014 · 610.1021/am502741m ↗
21. Highly reliable TaOx ReRAM and direct evidence of redox reaction mechanism10.1109/IEDM.2008.4796676 ↗
22. Waser · Adv. Mater. · 2009 · 21 · 263210.1002/adma.200900375 ↗
23. Yang · Nat. Nanotechnol. · 2013 · 8 · 1310.1038/nnano.2012.240 ↗
24. Splendiani · Nano Lett. · 2010 · 10 · 127110.1021/nl903868w ↗
25. Radisavljevic · Nat. Nanotechnol. · 2011 · 6 · 14710.1038/nnano.2010.279 ↗
26. Zhao · ACS Nano · 2013 · 7 · 79110.1021/nn305275h ↗
27. Huang · ACS Nano · 2014 · 8 · 92310.1021/nn405719x ↗
28. Wang · Adv. Mater. · 2016 · 28 · 830210.1002/adma.201602757 ↗
29. Wang · ACS Nano · 2015 · 9 · 524610.1021/acsnano.5b00655 ↗
30. Li · Nat. Nanotechnol. · 2014 · 9 · 37210.1038/nnano.2014.35 ↗
31. Susarla · Adv. Mater. · 2017 · 2910.1002/adma.201702457 ↗
32. Wang · Small · 2017 · 1310.1002/smll.201700894 ↗
33. Qiu · Nano Res. · 2016 · 9 · 231910.1007/s12274-016-1118-6 ↗
34. Zhan · Appl. Phys. Lett. · 2011 · 9910.1063/1.3640210 ↗
35. Sangwan · Nat. Nanotechnol. · 2015 · 10 · 40310.1038/nnano.2015.56 ↗
36. Sangwan · Nature · 2018 · 554 · 50010.1038/nature25747 ↗
37. Miao · Small · 2015 · 11 · 239210.1002/smll.201403422 ↗
38. Hou · Small · 2018 · 1410.1002/smll.201800319 ↗
39. Chen · Nano Sel. · 2021 · 2 · 124510.1002/nano.202000268 ↗
40. Lee · Adv. Mater. · 2016 · 28 · 919610.1002/adma.201603571 ↗
41. Zhu · Nano Res. · 2022 · 15 · 267410.1007/s12274-021-3774-4 ↗
42. Qin · J. Alloys Compd. · 2021 · 85610.1016/j.jallcom.2020.158179 ↗
43. Cao · IEEE Trans. Electron Devices · 2018 · 65 · 410910.1109/TED.2018.2867441 ↗
44. Zhang · Nanoscale · 2021 · 1310.1039/D1NR01683K ↗
45. Xu · Nano Lett. · 2019 · 19 · 241110.1021/acs.nanolett.8b05140 ↗
46. Liu · Nat. Nanotechnol. · 2018 · 13 · 40410.1038/s41565-018-0102-6 ↗
47. Cheng · Nano Lett. · 2016 · 16 · 57210.1021/acs.nanolett.5b04260 ↗
48. Wu · Adv. Mater. · 2019 · 3110.1002/adma.201806790 ↗
49. Zhou · ACS Appl. Mater. Interfaces · 2020 · 1210.1021/acsami.0c04493 ↗
50. Yan · Small · 2019 · 1510.1002/smll.201901423 ↗
51. Shi · Nat. Electron. · 2018 · 1 · 45810.1038/s41928-018-0118-9 ↗
52. Zheng · ACS Appl. Mater. Interfaces · 2018 · 1010.1021/acsami.8b07189 ↗
53. Okada · Phys. Rev. B · 2009 · 8010.1103/PhysRevB.80.161404 ↗