journal article·2017-12-01

Physical and electrical characteristics of Si/SiC quantum dot superlattice solar cells with passivation layer of aluminum oxide

Yi-Chia Tsai, Yiming Li, Seiji Samukawa

Nanotechnology· Volume 28· Issue 48
Publisher page

Abstract

Abstract In this work, we numerically simulate the silicon (Si)/silicon carbide (SiC) quantum dot superlattice solar cell (SiC-QDSL) with aluminum oxide (Al 2 O 3 -QDSL) passivation. By exploiting the passivation layer of Al 2 O 3 , the high photocurrent and the conversion efficiency can be achieved without losing the effective bandgap. Based on the two-photon transition mechanism in an AM1.5 and a one sun illumination, the simulated short-circuit current ( J sc ) of 4.77 mA cm −2 is very close to the experimentally measured 4.75 mA cm −2 , which is higher than those of conventional SiC-QDSLs. Moreover, the efficiency fluctuation caused by the structural variation is less sensitive by using the passivation layer. A high conversion efficiency of 17.4% is thus estimated by adopting the QD’s geometry used in the experiment; and, it can be further boosted by applying a hexagonal QD formation with an inter-dot spacing of 0.3 nm.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Silicon Nanostructures and Photoluminescence · Thin-Film Transistor Technologies · Nanowire Synthesis and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

National Chiao Tung University

Tohoku University

Funding

Ministry of Science and Technology, Taiwan

References (33)

Show source-provided references
1. Cabrera · J. Appl. Phys. · 2013 · 11310.1063/1.4775404 ↗
2. Toledo · J. Appl. Phys. · 2012 · 11110.1063/1.4723831 ↗
3. Sablon · J. Appl. Phys. · 2010 · 10810.1063/1.3486014 ↗
4. Guter · Appl. Phys. Lett. · 2009 · 9410.1063/1.3148341 ↗
5. Levy · IEEE Trans. Electron Devices · 2008 · 55 · 70610.1109/TED.2007.914829 ↗
6. Rühle · Sol. Energy · 2016 · 130 · 13910.1016/j.solener.2016.02.015 ↗
7. Shockley · J. Appl. Phys. · 1961 · 32 · 51010.1063/1.1736034 ↗
8. Walker · IEEE J. Photovolt. · 2013 · 3 · 111810.1109/JPHOTOV.2013.2257920 ↗
9. Walker · IEEE J. Photovolt. · 2014 · 4 · 109510.1109/JPHOTOV.2014.2322279 ↗
10. Walker · IEEE J. Quantum Electron. · 2014 · 50 · 19810.1109/JQE.2014.2301817 ↗
11. Nozawa · J. Appl. Phys. · 2013 · 11310.1063/1.4811681 ↗
12. Hu · J. Appl. Phys. · 2013 · 11410.1063/1.4821114 ↗
13. Kechiantz · Nanotechnology · 2007 · 1810.1088/0957-4484/18/40/405401 ↗
14. Okada · Appl. Phys. Rev. · 2015 · 210.1063/1.4916561 ↗
15. Hu · Nanotechnology · 2013 · 2410.1088/0957-4484/24/26/265401 ↗
16. Linares · J. Appl. Phys. · 2011 · 10910.1063/1.3527912 ↗
17. Martí · 2006 · 53910.1016/B978-044452844-5/50018-4 ↗
18. Conibeer · Mater. Today · 2007 · 10 · 4210.1016/S1369-7021(07)70278-X ↗
19. Tomić · IEEE J. Photovolt. · 2016 · 6 · 17910.1109/JPHOTOV.2015.2483368 ↗
20. Zhou · Appl. Phys. Lett. · 2010 · 9610.1063/1.3313938 ↗
21. Rahman · Prog. Photovolt., Res. Appl. · 2016 · 24 · 77410.1002/pip.2726 ↗
22. Tsai · IEEE Electron Device Lett. · 2016 · 37 · 75810.1109/LED.2016.2561205 ↗
23. Lee · IEEE Trans. Electron Devices · 2015 · 62 · 370910.1109/TED.2015.2474161 ↗
24. Rahman · Japan. J. Appl. Phys. · 2016 · 5510.7567/JJAP.55.032303 ↗
25. Samukawa · ECS J. Solid State Sci. Technol. · 2015 · 410.1149/2.0131506jss ↗
26. Samukawa · Japan. J. Appl. Phys. · 2006 · 45 · 239510.1143/JJAP.45.2395 ↗
27. Budiman · Nanotechnology · 2012 · 2310.1088/0957-4484/23/6/065302 ↗
28. Huang · Nanotechnology · 2011 · 2210.1088/0957-4484/22/10/105301 ↗
29. Luque · Phys. Rev. Lett. · 1997 · 78 · 501410.1103/PhysRevLett.78.5014 ↗
30. Luque · Nat. Photon. · 2012 · 6 · 14610.1038/nphoton.2012.1 ↗
31. Cuadra · IEEE Trans. Electron Devices · 2004 · 51 · 100210.1109/TED.2004.828161 ↗
32. Conibeer · Thin Solid Films · 2006 · 511 · 65410.1016/j.tsf.2005.12.119 ↗
33. Tsai · Japan. J. Appl. Phys. · 2016 · 5510.7567/JJAP.55.04EJ14 ↗