NC-AFM 2004: Proceedings of the 7th International Conference on Non-contact Atomic Force Microscopy

With the ongoing miniaturization of devices and controlled nanostructuring of materials, the importance of atomic-scale information on surfaces and surface properties is growing continuously. The astonishing progress in nanoscience and nanotechnology that took place during the last two decades was in many ways related to recent progress in high-resolution imaging techniques such as scanning tunnelling microscopy and transmission electron microscopy. Since the mid-1990s, non-contact atomic force microscopy (NC-AFM) performed in ultrahigh vacuum has evolved as an alternative technique that achieves atomic resolution, but without the restriction to conducting surfaces of the previously established techniques. Advances of the rapidly developing field of NC-AFM are discussed at annual conferences as part of a series that started in 1998 in Osaka, Japan. This special issue of Nanotechnology is a compilation of original work presented at the 7th International Conference on Non-contact Atomic Force Microscopy that took place in Seattle, USA, 12–15 September 2004.