Advances in Nanoimprint Lithography: 2‐ D and 3‐ D Nanopatterning of Surfaces by Nanoimoprint Lithography, Morphological Characterization, and Photonic Applications

Abstract The sections in this article are Introduction Three‐Dimensional, Nanoimprint‐Based Lithography Background Reverse NIL Reverse‐Contact UVNIL The Prospects for 3‐ D NIL Metrology for Nanoimprinting Introduction Scanning Electron Microscopy Atomic Force Microscopy Transmission Electron Microscopy Optical Critical Dimension Metrology: Scatterometry Other Methods Physical Properties Residual Layer Thickness in NIL Towards An Integrated Metrology Two‐Dimensional Nanopatterned Polymer Components for Photonic Applications Overview on Applications Realized by NIL Nanoimprinted Optical Resonators Nanoimprinted Polymeric Band‐Edge Lasers Patterning in Functionalized Polymers Outlook on Nanoimprinted Polymer Devices Conclusions Acknowledgments