Editorial for focus on emerging processes and applications of atomic and molecular layer deposition
Source abstract
Abstract
Abstract This Focus aims to provide a platform for the latest research progress in atomic and molecular layer deposition (ALD and MLD), which collects 10 original research articles and 2 review papers. The original research articles present new precursors, new processes, and new applications. The review papers give a timely summary on the surface chemistry of metal ALD processes and flexible electronics resulting from ALD and MLD, respectively. This ensemble forms a valuable collection that advances our understanding and knowledge of ALD and MLD, and inspires the continued development of these valuable technologies.
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Research context
OpenAlex topics: Semiconductor materials and devices · Electronic and Structural Properties of Oxides · Catalytic Processes in Materials Science
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (14)
Show source-provided references
1. Atomic layer deposition: an overview10.1021/cr900056b ↗
2. An overview of molecular layer deposition for organic and organic-inorganic hybrid materials: mechanisms, growth characteristics, and promising applications10.1039/C7TA04449F ↗
3. Atomic layer deposition of Al-doped ZnO nanomembrane with in situ monitoring10.1088/1361-6528/ad60ce ↗
4. Doped SnO2 thin films fabricated at low temperature by atomic layer deposition with a precise incorporation of niobium atoms10.1088/1361-6528/ad5afd ↗
5. Low temperature atomic layer deposition of PbO2 for electrochemical applications10.1088/1361-6528/ad8163 ↗
6. Atomic layer deposition for tuning the surface chemical composition of nickel iron phosphates for oxygen evolution reaction in alkaline electrolyzers10.1088/1361-6528/ad2e48 ↗
7. Activation of polyimide by oxygen plasma for atomic layer deposition of highly compact titanium oxide coating10.1088/1361-6528/ad3743 ↗
8. Plasma-enhanced atomic layer deposition of Sn-doped indium oxide semiconductor nano-films for thin-film transistors10.1088/1361-6528/ad6c56 ↗
9. Plasma enhanced atomic layer deposition of silicon nitride using magnetized very high frequency plasma10.1088/1361-6528/ad3740 ↗
10. Enhancing control in spatial atomic layer deposition: insights into precursor diffusion, geometric parameters, and CVD mitigation strategies10.1088/1361-6528/ad28d6 ↗
11. Synthesis of low-k SiONC thin films by plasma-assisted molecular layer deposition with tetraisocyanatesilane and phloroglucinol10.1088/1361-6528/ad60cd ↗
12. The surface chemistry of the atomic layer deposition of metal thin films10.1088/1361-6528/ad54cb ↗
13. Advancements in atomic-scale interface engineering for flexible electronics: enhancing flexibility and durability10.1088/1361-6528/ad64db ↗
14. Ultrathin In2O3 thin-film transistors deposited from trimethylindium and ozone10.1088/1361-6528/ad6993 ↗