High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals

While 3D-printing is currently experiencing significant growth and having a significant impact on science and technology, the expansion into the nanoworld is still a highly challenging task. Among the increasing number of approaches, focused electron-beam-induced deposition (FEBID) was recently demonstrated to be a viable candidate toward a generic direct-write fabrication technology with spatial nanometer accuracy for complex shaped 3D-nanoarchitectures. In this comprehensive study, we explore the parameter space for 3D-FEBID and investigate the implications of individual and interdependent parameters on freestanding nanosegments, which act as a fundamental building block for complex 3D-structures. In particular, the study provides new basic insights such as precursor transport limitations and angle dependent growth rates, both essential for high-fidelity fabrication. Complemented by practical aspects, we provide both basic insights in 3D-growth dynamics and technical guidance for specific process adaption to enable predictable and reliable direct-write synthesis of freestanding 3D-nanoarchitectures.