Surface energy-tunable iso decyl acrylate based molds for low pressure-nanoimprint lithography
Source abstract
Abstract
Abstract We presented surface energy-tunable nanoscale molds for unconventional lithography. The mold is highly robust, transparent, has a minimized haze, does not contain additives, and is a non-fluorinated isodecyl acrylate and trimethylolpropane triacrylate based polymer. By changing the mixing ratio of the polymer components, the cross-linking density, mechanical modulus, and surface energy (crucial factors in low pressure ((1–2) × 10 5 N m −2 ) low pressure-nanoimprint lithography (LP-NIL)), can be controlled. To verify these properties of the molds, we also characterized the surface energy by measuring the contact angles and calculating the work of adhesion among the wafer, polymer film, and mold for successful demolding in nanoscale structures. Moreover, the molds showed high optical clarity and precisely tunable mechanical and surface properties, capable of replicating sub-100 nm patterns by thermal LP-NIL and UV-NIL.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Force Microscopy Techniques and Applications · Adhesion, Friction, and Surface Interactions
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Sungkyunkwan University (SKKU)
Seoul National University
Center for Neuroscience Imaging Research, Institute for Basic Science (IBS), Suwon 16419,
Funding
Basic Science Research Program · Pioneer Research Center Program
References (38)
Show source-provided references
1. Rogers · 2009 · 28
2. Recent advances in unconventional lithography for challenging 3D hierarchical nanostructures and their applications10.1155/2016/7602395 ↗
3. Hydrophilic composite elastomeric mold for high-resolution soft lithography10.1021/la060790b ↗
4. Nanoimprint lithography: methods and material requirements10.1002/adma.200600882 ↗
5. A step toward next-generation nanoimprint lithography: extending productivity and applicability10.1007/s00339-015-9229-6 ↗
6. Low-cost fabrication of transparent hard replica molds for imprinting lithography10.1002/adma.200803243 ↗
7. Interfacial chemistries for nanoscale transfer printing10.1021/ja026355v ↗
8. Rigiflex lithography for nanostructure transfer10.1002/adma.200402010 ↗
9. Capillary force lithography10.1002/1521-4095(200109)13:18<1386::AID-ADMA1386>3.0.CO;2-X ↗
10. Polymer imprint lithography with molecular-scale resolution10.1021/nl048355u ↗
11. Permeability- and surface energy tunable polyurethane acrylate molds for capillary force lithography10.1021/acsami.5b06975 ↗
12. Step and flash imprint lithography: template surface treatment and defect analysis10.1116/1.1324618 ↗
13. On the mechanism of low-pressure imprint lithography: capillarity versus viscous flow10.1021/la703084p ↗
14. Antiadhesion surface treatments of molds for high-resolution unconventional lithography10.1002/adma.200601268 ↗
15. Simple method for lowering poly(methyl methacrylate) surface energy with fluorination10.1038/pj.2014.91 ↗
16. Self-assembled monolayers of thiolates on metals as a form of nanotechnology10.1021/cr0300789 ↗
17. Self-assembled monolayers of thiolates on metals as a form of nanotechnology10.1021/cr0300789 ↗
18. Tien · 1998 · 227
19. Soft lithography using acryloxy perfluoropolyether composite stamps10.1021/la062981k ↗
20. A photocurable poly(dimethylsiloxane) chemistry designed for soft lithographic molding and printing in the nanometer regime10.1021/ja029973k ↗
21. Sub-100 nm patterning with an amorphous fluoropolymer mold10.1021/la0358668 ↗
22. Multiscale transfer printing into recessed microwells and on curved surfaces via hierarchical perfluoropolyether stamps10.1002/smll.201300772 ↗
23. Siliconized silsesquioxane-based nonstick molds for ultrahigh-resolution10.1039/c2jm32386a ↗
24. Impact of environmental regulation on green electronics manufacture10.1108/13565360610659716 ↗
25. Modulus- and surface energy-tunable ultraviolet-curable polyurethane acrylate: properties and applications10.1039/c1jm12201k ↗
26. Phase behavior and optical- and mechanical properties of the binary system isotactic polypropylene and the nucleating/clarifying agent 1,2figf,3-trideoxy-4,6:5,7-bis-O-[(4-propylphenyl) methylene]-nonitol10.1016/j.polymer.2009.03.010 ↗
27. The binary system isotactic polypropylene/bis(3,4-dimethylbenzylidene)sorbitol: phase behavior, nucleation, and optical properties10.1021/ma030146t ↗
28. Luigia · 2014 · 8
29. Ultra-low surfae energy polymers: the molecular design requirements10.1002/adma.200301638 ↗
30. The analysis of oxygen plasma pretreatment for improving anodic bonding10.1149/1.1419187 ↗
31. Rigiflex, spontaneously wettable polymeric mold for forming reversibly bonded nanocapillaries10.1021/la0633942 ↗
32. Low-pressure nanoimprint lithography10.1021/nl049887d ↗
33. An ultraviolet-curable mold for sub-100 nm lithography10.1021/ja048972k ↗
34. Pavia · 2014 · 14
35. Synthesis of novel UV-curable difunctional thiourethane methacrylate and studies on organic-inorganic nanocomposite hard coatings for high refractive index plastic lenses10.1016/j.porgcoat.2008.01.002 ↗
36. Optically transparent, amphiphilic networks based on blends of perfluoropolyethers and poly(ethylene glycol)10.1021/ja803991n ↗
37. Estimation of the surface free energy of polymers10.1002/app.1969.070130815 ↗
38. Stretched polymer nanohairs by nanodrawing10.1021/nl061045m ↗