journal article·2015-10-23Open access

Excellent nonlinearity of a selection device based on anti-series connected Zener diodes for ultrahigh-density bipolar RRAM arrays

Yingtao Li, Rongrong Li, Liping Fu, Xiaoping Gao, Yang Wang, Chunlan Tao

Nanotechnology· Volume 26· Issue 42

Abstract

A crossbar array is usually used for the high-density application of a resistive random access memory (RRAM) device. However, the cross-talk interference limits the increase in the integration density. In this paper, anti-series connected Zener diodes as a selection device are proposed for bipolar RRAM arrays. Simulation results show that, by using the anti-series connected Zener diodes as a selection device, the readout margin is sufficiently improved compared to that obtained without a selection device or with anti-parallel connected diodes as the selection device. The maximum size of the crossbar arrays with anti-series connected Zener diodes as a selection device over 1 TB is estimated by theoretical simulation. In addition, the feasibility of using the anti-series connected Zener diodes as a selection device for bipolar RRAM is demonstrated experimentally. These results indicate that anti-series connected Zener diodes as a selection device opens up great opportunities to realize ultrahigh-density bipolar RRAM arrays.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (29)

Show source-provided references
1. 10.1126/science.115390910.1126/science.1153909 ↗
2. 10.1002/adma.20090037510.1002/adma.200900375 ↗
3. 10.1002/adma.20110410410.1002/adma.201104104 ↗
4. 10.1021/nn101758210.1021/nn1017582 ↗
5. 10.1021/nn505131b10.1021/nn505131b ↗
6. 10.1002/adma.20130198310.1002/adma.201301983 ↗
7. 10.1038/srep0968010.1038/srep09680 ↗
8. 10.1109/LED.2009.203627610.1109/LED.2009.2036276 ↗
9. 10.1038/nnano.2008.16010.1038/nnano.2008.160 ↗
10. Kim G H · Nanotechnology · 2010 · 21
11. Li Y T · J. Phys. D: Appl. Phys. · 2014 · 47
12. 10.1002/adfm.20120217010.1002/adfm.201202170 ↗
13. 10.1039/c3nr33370a10.1039/c3nr33370a ↗
14. 10.1109/LED.2009.203984910.1109/LED.2009.2039849 ↗
15. 10.1002/adma.20090320310.1002/adma.200903203 ↗
16. International Technology Roadmap for Semiconductors · 2007
17. 10.1038/nmat307010.1038/nmat3070 ↗
18. 10.1021/nl203687n10.1021/nl203687n ↗
19. 10.1109/LED.2011.216125910.1109/LED.2011.2161259 ↗
20. 10.1109/LED.2011.216369710.1109/LED.2011.2163697 ↗
21. 10.1002/adma.20110239510.1002/adma.201102395 ↗
22. 10.1109/LED.2011.216160110.1109/LED.2011.2161601 ↗
23. 10.1021/nn302877610.1021/nn3028776 ↗
24. Li Y T · Nanotechnology · 2014 · 25
25. 10.1109/TED.2012.222514710.1109/TED.2012.2225147 ↗
26. 10.1109/LED.2012.221085510.1109/LED.2012.2210855 ↗
27. 10.1038/nmat274810.1038/nmat2748 ↗
28. 10.1109/TED.2012.220115810.1109/TED.2012.2201158 ↗
29. Huang J J · IEDM Tech. Dig. · 2011 · 733