Correction: Atomic layer deposition of a MoS 2 film
Source abstract
Abstract
Correction for 'Atomic layer deposition of a MoS2 film' by Lee Kheng Tan et al., Nanoscale, 2014, 6, 10584-10588.
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Semiconductor materials and devices · Ferroelectric and Negative Capacitance Devices · Electrocatalysts for Energy Conversion
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References
Reference metadata was not supplied for this record.