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journal article·2022Open access

Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films

Maxime Gayrard, Benedetta Marmiroli, Francois Chancerel, Philippe Decorse, Heinz Amenitsch, Jennifer Peron, Andrea Cattoni, Marco Faustini

Nanoscale· Volume 14· Issue 5
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Source abstract

Abstract

Noble metal coordination xerogel films (mesostructured with block-copolymers) exhibit solubility switching with increasing X-ray irradiation. Different from other sol-gel systems, these are attributed to film deconstruction under irradiation. These materials can be used as recyclable negative tone resists for deep X-ray lithography that can be further converted into metallic nanoarchitectured films.
Source: openalex_inverted_index · Quality: candidate unverified · Source record ↗

Research context

Nanomaterials

OpenAlex topics: Block Copolymer Self-Assembly · X-ray Diffraction in Crystallography · Silicone and Siloxane Chemistry

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Sorbonne Université, CNRS, Laboratoire Chimie de la Matière Condensée de Paris (LCMCP), F-75005 Paris, France

Institute of Inorganic Chemistry, Graz University of Technology, Graz, Austria

Institut Photovoltaïque d'Ile-de-France (IPVF), CNRS UMR 9006, Palaiseau, France

Centre de Nanosciences et de Nanotechnologies (C2N), CNRS UMR 9001, Université Paris-Saclay, Palaiseau, France

Université de Paris, ITODYS, CNRS, UMR 7086, 15 rue J-A de Baïf, F-75013 Paris, France

Funding

H2020 European Research Council · Agence Nationale de la Recherche · Commissariat Général à l'Investissement

References (28)

Show source-provided references
1. Mallavarapu · ACS Appl. Mater. Interfaces · 2021 · 13 · 116910.1021/acsami.0c17011 ↗
2. Grobis · Appl. Phys. Lett. · 2011 · 98
3. Chen · Nat. Energy · 2019 · 4 · 76110.1038/s41560-019-0434-y ↗
4. Ryoo · Lab Chip · 2011 · 11 · 37810.1039/C0LC00448K ↗
5. Jiang · Angew. Chem., Int. Ed. · 2017 · 56 · 783610.1002/anie.201703609 ↗
6. Gutiérrez · Appl. Sci. · 2018 · 8 · 6410.3390/app8010064 ↗
7. R. J.Seymour and J.O'Farrelly , Kirk–Othmer Encyclopedia of Chemical Technology , 2000 , pp. 1–37 , 10.1002/0471238961.1612012019052513.a01.pub310.1002/0471238961.1612012019052513.a01.pub3 ↗
8. Arunagiri · Appl. Phys. Lett. · 2005 · 86 · 08310410.1063/1.1867560 ↗
9. Watson · Nano Lett. · 2015 · 15 · 109510.1021/nl5040623 ↗
10. Dalstein · Adv. Funct. Mater. · 2016 · 26 · 8110.1002/adfm.201503016 ↗
11. Tu · Nat. Mater. · 2021 · 20 · 9310.1038/s41563-020-00827-x ↗
12. Faustini · Nat. Mater. · 2021 · 20 · 810.1038/s41563-020-00837-9 ↗
13. Dalstein · Angew. Chem., Int. Ed. · 2017 · 56 · 1401110.1002/anie.201706745 ↗
14. Cattoni · Microelectron. Eng. · 2018 · 193 · 1810.1016/j.mee.2018.02.015 ↗
15. Faustini · Chem. Mater. · 2014 · 26 · 70910.1021/cm402132y ↗
16. Faustini · Chem. Mater. · 2010 · 22 · 568710.1021/cm101502n ↗
17. Faustini · J. Mater. Chem. · 2011 · 21 · 359710.1039/c0jm03493b ↗
18. Falcaro · Adv. Mater. · 2009 · 21 · 493210.1002/adma.200901561 ↗
19. Malfatti · Chem. Mater. · 2010 · 22 · 213210.1021/cm902625v ↗
20. Ceratti · Adv. Mater. · 2015 · 27 · 495810.1002/adma.201502518 ↗
21. Innocenzi · Soft Matter · 2010 · 6 · 317210.1039/b925105g ↗
22. Gayrard · Nano Lett. · 2021 · 21 · 231010.1021/acs.nanolett.1c00178 ↗
23. Duran · ChemElectroChem · 2021 · 8 · 351910.1002/celc.202100649 ↗
24. Odziomek · Mater. Horiz. · 2020 · 7 · 54110.1039/C9MH01408J ↗
25. Silverstein · J. Chem. Educ. · 1962 · 39 · 54610.1021/ed039p546 ↗
26. Pielichowski · J. Anal. Appl. Pyrolysis · 2005 · 73 · 13110.1016/j.jaap.2005.01.003 ↗
27. Innocenzi · Soft Matter · 2012 · 8 · 372210.1039/c2sm07028f ↗
28. Povar · J. Electrochem. Sci. Eng. · 2016 · 6 · 14510.5599/jese.229 ↗