journal article·2017

Stabilization of a Ga-adlayer structure with the zincblende stacking sequence in the GaN(0 0 0 −1) surface at the nanoscale

Sung Bo Lee, Seung Jo Yoo, Kunsu Kim, Yong-Sung Kim, Young-Min Kim, Jin-Gyu Kim, Heung Nam Han

Nanoscale· Volume 9· Issue 7
Publisher page

Abstract

Profile imaging by in situ high-resolution transmission electron microscopy is used to elucidate reconstructions of the GaN(0 0 0 -1) surface during annealing in the TEM. We have successfully captured a detailed process of a change from the stacking sequence of the wurtzite to that of the zincblende structure in the topmost three Ga layers for the surface with nanoscale hill-and-valley structures. For ab initio calculations of the change in the sequence, a model structure is approximated by the addition of a 1 × 1 Ga layer on the GaN(0 0 0 -1) surface (i.e., 1 × 1 Ga-adlayer structure). The ab initio calculations predict that, as the surface size decreases, the 1 × 1 Ga-adlayer structure with the wurtzite stacking sequence in the topmost three Ga layers becomes destabilized against the adlayer with the zincblende stacking sequence in the surface layers, which well elucidates the experimental observation.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Semiconductor materials and devices · Ga2O3 and related materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (33)

Show source-provided references
1. H. Morkoç , Handbook of Nitride Semiconductors and Devices, Wiley, Weinheim, 2008, vol. 1, ch. 1
2. Yeh · Phys. Rev. B: Condens. Matter · 1992 · 46 · 1008610.1103/PhysRevB.46.10086 ↗
3. Das · Solid-State Electron. · 1976 · 19 · 85110.1016/0038-1101(76)90042-3 ↗
4. Sitar · J. Mater. Sci. Lett. · 1992 · 11 · 26110.1007/BF00729406 ↗
5. Ramírez-Flores · Phys. Rev. B: Condens. Matter · 1994 · 50 · 843310.1103/PhysRevB.50.8433 ↗
6. Lin · Appl. Phys. Lett. · 1995 · 67 · 269910.1063/1.114297 ↗
7. Weng · J. Appl. Phys. · 2002 · 92 · 401210.1063/1.1504177 ↗
8. Wood · J. Appl. Phys. · 2011 · 110 · 12430710.1063/1.3665122 ↗
9. Wood · Appl. Phys. Lett. · 2012 · 100 · 20311310.1063/1.4714918 ↗
10. Liu · Cryst. Growth Des. · 2008 · 8 · 55910.1021/cg0705963 ↗
11. Johnson · Nat. Mater. · 2002 · 1 · 10610.1038/nmat728 ↗
12. Huang · Nano Lett. · 2002 · 2 · 10110.1021/nl015667d ↗
13. Huang · Science · 2001 · 294 · 131310.1126/science.1066192 ↗
14. Cheng · Appl. Phys. Lett. · 2006 · 75 · 245510.1063/1.125046 ↗
15. Xue · Physica E · 2005 · 30 · 17910.1016/j.physe.2005.09.004 ↗
16. Han · Appl. Phys. Lett. · 2002 · 81 · 505110.1063/1.1531836 ↗
17. Tham · Adv. Funct. Mater. · 2006 · 16 · 119710.1002/adfm.200500807 ↗
18. Tham · Appl. Phys. A · 2006 · 85 · 22710.1007/s00339-006-3705-y ↗
19. Jacobs · Nano Lett. · 2007 · 7 · 143510.1021/nl062871y ↗
20. Kang · Cryst. Growth Des. · 2010 · 10 · 258110.1021/cg901546t ↗
21. Banerjee · J. Phys.: Condens. Matter · 2000 · 12 · 10647
22. Ito · J. Cryst. Growth · 2001 · 227–228 · 36610.1016/S0022-0248(01)00725-4 ↗
23. Smith · Phys. Rev. Lett. · 1997 · 79 · 393410.1103/PhysRevLett.79.3934 ↗
24. Smith · J. Vac. Sci. Technol. · 1998 · 16 · 224210.1116/1.590156 ↗
25. Kresse · Phys. Rev. B: Condens. Matter · 1999 · 59 · 175810.1103/PhysRevB.59.1758 ↗
26. Blöchl · Phys. Rev. B: Condens. Matter · 1994 · 50 · 1795310.1103/PhysRevB.50.17953 ↗
27. Perdew · Phys. Rev. B: Condens. Matter · 1992 · 45 · 1324410.1103/PhysRevB.45.13244 ↗
28. Hahn · Z. Anorg. Chem. · 1940 · 244 · 11110.1002/zaac.19402440203 ↗
29. Munir · J. Chem. Phys. · 1965 · 42 · 422310.1063/1.1695924 ↗
30. Koleske · J. Cryst. Growth · 2001 · 223 · 46610.1016/S0022-0248(01)00617-0 ↗
31. Egerton · Micron · 2004 · 35 · 39910.1016/j.micron.2004.02.003 ↗
32. D. B. Williams and C. B.Carter, Transmission electron microscopy, Plenum, New York, 199610.1007/978-1-4757-2519-3 ↗
33. Dreyer · Phys. Rev. B: Condens. Matter · 2014 · 89 · 081305(R)10.1103/PhysRevB.89.081305 ↗