journal article·2025

Phase control in polymorphic transformation-based nonvolatile memory devices for reliable data reading in X-point structures

Shunsuke Mori, Shogo Hatayama, Yuji Sutou

Nanoscale· Volume 17· Issue 42
Publisher page

Abstract

The MnTe polymorph, which exhibits reversible and nonvolatile phase transformations between NiAs- and wurtzite-type structures, is a promising candidate for next-generation phase-change memory technologies. These melting-free polymorphic transformations realize low-energy and high-speed operation. However, the wurtzite-type β' phase-the metastable, highly resistive state in MnTe-based memory devices -remains fundamentally underexplored. In this work, we investigate the effects of the resistivity (ρβ') and volume fraction (fβ') of the metastable β' phase on the memory performance. A percolation model relating fβ' to the resistive contrast (ΔR) suggests that ρβ' ≈ 500 Ω cm is a plausible value. Based on this model, we fabricated several memory cells with varying ΔR to evaluate their threshold characteristics from the β' to the α phase. The I-V curves reveal that the threshold voltage (Vth) increases with increasing ΔR. These results demonstrate that threshold parameters can be systematically modulated by controlling fβ' and the MnTe layer thickness. This tunability is crucial for bridging the Vth gap between MnTe-based phase-change materials and Ovonic threshold switch materials, offering valuable insights into the design of polymorphic transformation-based memory devices compatible with three-dimensional X-point architectures.
Source: europepmc · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Neural Networks and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Aoba-ku, Sendai, 980-8579, Japan

Semiconductor Frontier Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba 305-8568, Japan

WPI-Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

Funding

Japan Society for the Promotion of Science · Mitsubishi Foundation

References (65)

Show source-provided references
1. Cheng · J. Phys. D: Appl. Phys. · 2019 · 52 · 47300210.1088/1361-6463/ab39a0 ↗
2. Zhu · MRS Bull. · 2019 · 44 · 71510.1557/mrs.2019.206 ↗
3. Seo · AIP Adv. · 2025 · 15 · 02502310.1063/5.0252225 ↗
4. Wuttig · Nat. Mater. · 2007 · 6 · 82410.1038/nmat2009 ↗
5. Yamada · J. Appl. Phys. · 1991 · 69 · 284910.1063/1.348620 ↗
6. Ovshinsky · Phys. Rev. Lett. · 1968 · 21 · 145010.1103/PhysRevLett.21.1450 ↗
7. Kuzum · Nano Lett. · 2011 · 12 · 217910.1021/nl201040y ↗
8. Li · Phys. Status Solidi RRL · 2019 · 13 · 180055810.1002/pssr.201800558 ↗
9. Hatayama · Acta Mater. · 2023 · 258 · 11920910.1016/j.actamat.2023.119209 ↗
10. Ahn · Nano Lett. · 2015 · 15 · 680910.1021/acs.nanolett.5b02661 ↗
11. Simpson · Nat. Nanotechnol. · 2011 · 6 · 50110.1038/nnano.2011.96 ↗
12. Boniardi · Phys. Status Solidi RRL · 2019 · 13 · 180063410.1002/pssr.201800634 ↗
13. Shuang · ACS Nano · 2024 · 18 · 2113510.1021/acsnano.4c03574 ↗
14. Hatayama · ACS Nano · 2024 · 18 · 297210.1021/acsnano.3c07960 ↗
15. Liu · Adv. Funct. Mater. · 2024 · 34 · 240723910.1002/adfm.202407239 ↗
16. Tao · Nano Lett. · 2013 · 13 · 350110.1021/nl400888p ↗
17. Choi · Adv. Mater. · 2017 · 29 · 170356810.1002/adma.201703568 ↗
18. Ullah · Nanophotonics · 2024 · 13 · 208910.1515/nanoph-2023-0725 ↗
19. Wang · Nature · 2017 · 550 · 48710.1038/nature24043 ↗
20. Yang · Appl. Phys. Lett. · 2022 · 121 · 20350810.1063/5.0127160 ↗
21. D.-Y.Zhang , S.-Q.Wang , Z.-J.Tang , X.-S.Miao and Y.-H.He , Melting-Free Phase-Change Memory for Associative Learning , in Proceedings of the 2022 IEEE 16th International Conference on Solid-State & Integrated Circuit Technology (ICSICT) , Nanjing, China , 2022 . 10.1109/ICSICT55466.2022.996330710.1109/ICSICT55466.2022.9963307 ↗
22. Hatayama · J. Mater. Chem. C · 2022 · 10 · 1062710.1039/d2tc01281b ↗
23. Kim · ACS Nano · 2025 · 19 · 3023310.1021/acsnano.5c07687 ↗
24. Cui · Commun. Chem. · 2021 · 4 · 12510.1038/s42004-021-00565-4 ↗
25. Efthimiopoulos · Sci. Rep. · 2013 · 3 · 266510.1038/srep02665 ↗
26. Mori · Nat. Commun. · 2020 · 11 · 8510.1038/s41467-019-13747-5 ↗
27. Kim · APL Mater. · 2025 · 13 · 06110810.1063/5.0266675 ↗
28. Orlova · EPL · 2021 · 135 · 3700210.1209/0295-5075/ac2247 ↗
29. Katase · Sci. Adv. · 2021 · 7 · eabf272510.1126/sciadv.abf2725 ↗
30. Tanimura · J. Appl. Phys. · 2024 · 136 · 22310110.1063/5.0221427 ↗
31. Nakamura · Nano Lett. · 2020 · 20 · 493210.1021/acs.nanolett.0c01006 ↗
32. Tanimura · Phys. Rev. B · 2022 · 105 · 24540210.1103/PhysRevB.105.245402 ↗
33. Orihara · Phys. Status Solidi RRL · 2025 · 19 · 240043010.1002/pssr.202400430 ↗
34. Tsuruta · Phys. Status Solidi RRL · 2025 · 19 · 250001810.1002/pssr.202500018 ↗
35. Shuang · Adv. Funct. Mater. · 2025 · 250309410.1002/adfm.202503094 ↗
36. Mori · Mater. Des. · 2020 · 196 · 10914110.1016/j.matdes.2020.109141 ↗
37. Mori · Materialia · 2022 · 24 · 10149310.1016/j.mtla.2022.101493 ↗
38. Mori · ACS Appl. Mater. Interfaces · 2023 · 15 · 4273010.1021/acsami.3c07537 ↗
39. Siol · J. Mater. Chem. C · 2018 · 6 · 629710.1039/C8TC01828F ↗
40. Han · Phys. Rev. Appl. · 2020 · 13 · 01401210.1103/PhysRevApplied.13.014012 ↗
41. Jain · Phys. Rev. Mater. · 2024 · 8 · 01420310.1103/PhysRevMaterials.8.014203 ↗
42. Jeon · J. Mater. Chem. C · 2025 · 13 · 676210.1039/D4TC05499G ↗
43. Mori · Mater. Trans. · 2018 · 59 · 150610.2320/matertrans.M2018086 ↗
44. Mori · Jpn. J. Appl. Phys. · 2021 · 60 · 04550410.35848/1347-4065/abee03 ↗
45. Kim · Phys. Status Solidi RRL · 2022 · 16 · 210064110.1002/pssr.202100641 ↗
46. Mori · Jpn. J. Appl. Phys. · 2024 · 63 · 04550210.35848/1347-4065/ad32e7 ↗
47. Wu · Nanomaterials · 2025 · 15 · 23110.3390/nano15030231 ↗
48. A.Verdy , M.Bernard , J.Garrione , G.Bourgeois , M. C.Cyrille , E.Nolot , N.Castellani , P.Noé , C.Socquet-Clerc , T.Magis , G.Sassine , G.Molas , G.Navarro and E.Nowak , Optimized reading window for crossbar arrays thanks to Ge-Se-Sb-N-based OTS selectors , in Proc. IEEE Int. Electron Devices Meet. (IEDM) , San Francisco, CA , 2018 , pp. 37.4.1–37.4.4 . 10.1109/IEDM.2018.861468610.1109/IEDM.2018.8614686 ↗
49. Ban · IEEE Trans. Electron Devices · 2023 · 70 · 103410.1109/TED.2023.3236913 ↗
50. Hatayama · ACS Appl. Mater. Interfaces · 2022 · 14 · 4460410.1021/acsami.2c13189 ↗
51. Kim · J. Appl. Phys. · 2005 · 97 · 08353810.1063/1.1875742 ↗
52. Hatayama · ACS Appl. Mater. Interfaces · 2018 · 10 · 272510.1021/acsami.7b16755 ↗
53. Shuang · Sci. Rep. · 2019 · 9 · 2020910.1038/s41598-019-56768-2 ↗
54. Shuang · Appl. Phys. Lett. · 2018 · 112 · 18350410.1063/1.5029327 ↗
55. Wełnic · Mater. Today · 2008 · 11 · 2010.1016/S1369-7021(08)70118-4 ↗
56. Saxena · Sci. Rep. · 2019 · 9 · 1925110.1038/s41598-019-55874-5 ↗
57. Zhao · Nano-Micro Lett. · 2024 · 16 · 8110.1007/s40820-023-01289-x ↗
58. H.-Y.Cheng , W.-C.Chien , I.-T.Kuo , C.-W.Yeh , L.Gignac , W.Kim , E. K.Lai , Y.-F.Lin , R. L.Bruce , C.Lavoie , C.-W.Cheng , A.Ray , F. M.Lee , F.Carta , C.-H.Yang , M.-H.Lee , H.-Y.Ho , M.BrightSky and H.-L.Lung , ltra-high endurance and low IOFF selector based on AsSeGe chalcogenides for wide memory window 3D stackable crosspoint memory , in Proc. IEEE Int. Electron Devices Meet. (IEDM) , San Francisco, CA , 2018 , pp. 37.3.1–37.3.4 . 10.1109/IEDM.2018.861458010.1109/IEDM.2018.8614580 ↗
59. H. Y.Cheng , W. C.Chien , I. T.Kuo , E. K.Lai , Y.Zhu , J. L.Jordan-Sweet , A.Ray , F.Carta , F. M.Lee , P. H.Tseng , M. H.Lee , Y. Y.Lin , W.Kim , R.Bruce , C. W.Yeh , C. H.Yang , M.BrightSky and H. L.Lung , An ultra high endurance and thermally stable selector based on TeAsGeSiSe chalcogenides compatible with BEOL IC integration for cross-point PCM , in Proc. IEEE Int. Electron Devices Meet. (IEDM) , San Francisco, CA , 2017 , pp. 2.2.1–2.2.4 . 10.1109/IEDM.2017.826831010.1109/IEDM.2017.8268310 ↗
60. M.-J.Lee , D.Lee , H.Kim , H.-S.Choi , J.-B.Park and H. G.Kim , Highly-scalable threshold switching select device based on chalcogenide glasses for 3D nanoscaled memory arrays , in Proc. IEEE Int. Electron Devices Meet. (IEDM) , San Francisco, CA , 2012 , pp. 10.2.1–10.2.4 . 10.1109/IEDM.2012.647896610.1109/IEDM.2012.6478966 ↗
61. Zhu · MRS Bull. · 2019 · 44 · 71510.1557/mrs.2019.206 ↗
62. Saxena · Sci. Rep. · 2021 · 11 · 611110.1038/s41598-021-85690-9 ↗
63. Yuan · Appl. Surf. Sci. · 2023 · 640 · 15836210.1016/j.apsusc.2023.158362 ↗
64. Yuan · ACS Appl. Mater. Interfaces · 2024 · 16 · 1777810.1021/acsami.3c19048 ↗
65. Wang · Nanoscale Res. Lett. · 2017 · 12 · 34710.1186/s11671-017-2114-9 ↗