journal article·2014Open access

Tungsten oxide nanorod growth by pulsed laser deposition: influence of substrate and process conditions

Peng Huang, M. Mazhar Ali Kalyar, Richard F. Webster, David Cherns, Michael N. R. Ashfold

Nanoscale· Volume 6· Issue 22

Abstract

Tungsten oxide nanorods (NRs) have been grown on W, Ta and Cu substrates following 193 nm pulsed laser ablation of a WO3 target in a low background pressure of oxygen. The deposited materials were analysed by scanning and (high resolution) transmission electron microscopy (HRTEM), selected area electron diffraction (SAED), X-ray diffraction, Raman and X-ray photoemission spectroscopy, and tested for field emission. In each case, HRTEM analysis shows NR growth along the [100] direction, and clear stacking faults running along this direction (which are also revealed by streaking in the SAED pattern perpendicular to the growth axis). The NR composition in each case is thus determined as sub-stoichiometric WO(3-δ), but the NR morphologies are very different. NRs grown on W or Ta are short (hundreds of nm in length) and have a uniform cross-section, whereas those grown on a Cu substrate are typically an order of magnitude larger, tapered, and display a branched, dendritic microstructure. Only these latter NRs give significant field emission.
Source: openalex_inverted_index · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: ZnO doping and properties · Transition Metal Oxide Nanomaterials · Ga2O3 and related materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Chemistry

University of Bristol

Bristol, UK

School of Physics

References (49)

Show source-provided references
1. Zheng · Adv. Funct. Mater. · 2011 · 21 · 217510.1002/adfm.201002477 ↗
2. C. G. Granqvist , Handbook of Inorganic Electrochromic Materials , Elsevier , New York , 1995
3. Niklasson · J. Mater. Chem. · 2007 · 17 · 12710.1039/B612174H ↗
4. Zhao · Angew. Chem., Int. Ed. · 2008 · 47 · 705110.1002/anie.200802207 ↗
5. Liu · Phys. Chem. Chem. Phys. · 2012 · 14 · 789410.1039/c2cp40976c ↗
6. Ponzoni · Appl. Phys. Lett. · 2006 · 88 · 20310110.1063/1.2203932 ↗
7. Devan · Adv. Funct. Mater. · 2012 · 22 · 332610.1002/adfm.201201008 ↗
8. Zheng · Langmuir · 2010 · 26 · 1914810.1021/la103692y ↗
9. Allpress · J. Solid State Chem. · 1971 · 3 · 44010.1016/0022-4596(71)90083-1 ↗
10. Gu · J. Phys. Chem. B · 2006 · 110 · 2382910.1021/jp065170y ↗
11. Wang · J. Phys. Chem. C · 2008 · 112 · 1430610.1021/jp804035r ↗
12. Kalantar-Zadeh · Chem. Mater. · 2010 · 22 · 566010.1021/cm1019603 ↗
13. Zhang · Cryst. Growth Des. · 2012 · 12 · 264610.1021/cg300226r ↗
14. Zhang · CrystEngComm · 2014 · 16 · 249110.1039/C3CE42320D ↗
15. Thangala · Small · 2007 · 3 · 89010.1002/smll.200600689 ↗
16. Smith · J. Mater. Chem. A · 2014 · 2 · 612110.1039/C3TA14163B ↗
17. Mitsugi · Jpn. J. Appl. Phys., Part 1 · 2002 · 41 · 537210.1143/JJAP.41.5372 ↗
18. Aoki · J. Vac. Sci. Technol., A · 2005 · 23 · 132510.1116/1.1978891 ↗
19. Ramana · J. Phys. Chem. B · 2006 · 110 · 1043010.1021/jp056664i ↗
20. Suda · Thin Solid Films · 2008 · 516 · 439710.1016/j.tsf.2007.10.023 ↗
21. Lethy · Appl. Surf. Sci. · 2008 · 254 · 236910.1016/j.apsusc.2007.09.068 ↗
22. Santo · Appl. Phys. A · 2010 · 101 · 32510.1007/s00339-010-5825-7 ↗
23. Zou · J. Alloys Compd. · 2014 · 583 · 46510.1016/j.jallcom.2013.08.166 ↗
24. Yaacob · J. Korean Phys. Soc. · 2012 · 60 · 39310.3938/jkps.60.393 ↗
25. Ahmad · J. Nanosci. Nanotechnol. · 2013 · 13 · 831510.1166/jnn.2013.8210 ↗
26. Sun · Chem. Phys. Lett. · 2004 · 396 · 2110.1016/j.cplett.2004.07.110 ↗
27. Fuge · Chem. Phys. Lett. · 2009 · 479 · 12510.1016/j.cplett.2009.08.008 ↗
28. Tokunaga · Nanoscale Res. Lett. · 2012 · 7 · 8510.1186/1556-276X-7-85 ↗
29. Jeon · J. Mater. Res. · 2008 · 23 · 132
30. Miyano · Jpn. J. Appl. Phys. · 1983 · 22 · 86310.1143/JJAP.22.863 ↗
31. Sloan · J. Solid State Chem. · 1990 · 144 · 10010.1006/jssc.1998.8125 ↗
32. Gerand · J. Solid State Chem. · 1979 · 29 · 42910.1016/0022-4596(79)90199-3 ↗
33. Zhu · Chem. Phys. Lett. · 1999 · 309 · 32710.1016/S0009-2614(99)00732-0 ↗
34. Zhou · Adv. Mater. · 2005 · 17 · 210710.1002/adma.200500885 ↗
35. Ponzoni · Sens. Actuators, B · 2011 · 153 · 34010.1016/j.snb.2010.10.045 ↗
36. Rajagopal · Nanoscale Res. Lett. · 2009 · 4 · 133510.1007/s11671-009-9402-y ↗
37. Wong · Thin Solid Films · 2000 · 376 · 13110.1016/S0040-6090(00)01204-9 ↗
38. Shim · Sol. Energy Mater. Sol. Cells · 2009 · 93 · 206210.1016/j.solmat.2009.02.008 ↗
39. Pal · Appl. Surf. Sci. · 2007 · 253 · 331710.1016/j.apsusc.2006.07.026 ↗
40. Xie · J. Electron Spectrosc. Relat. Phenom. · 2012 · 185 · 11210.1016/j.elspec.2012.01.004 ↗
41. Daniel · J. Solid State Chem. · 1987 · 67 · 23510.1016/0022-4596(87)90359-8 ↗
42. Santato · J. Am. Chem. Soc. · 2001 · 123 · 1063910.1021/ja011315x ↗
43. Kubo · J. Electrochem. Soc. · 1998 · 145 · 172910.1149/1.1838548 ↗
44. Zou · J. Appl. Phys. · 2012 · 112 · 04490310.1063/1.4748336 ↗
45. Li · Adv. Mater. · 2003 · 15 · 129410.1002/adma.200305122 ↗
46. Liu · Small · 2005 · 1 · 31010.1002/smll.200400054 ↗
47. Liu · J. Mater. Chem. C · 2013 · 1 · 321710.1039/c3tc30340c ↗
48. Fowler · Proc. R. Soc. London, Ser. A · 1928 · 119 · 17310.1098/rspa.1928.0091 ↗
49. Seelaboyina · Nanotechnology · 2005 · 17 · 484010.1088/0957-4484/17/19/010 ↗