High-quality epitaxial wurtzite structured InAs nanosheets grown in MBE
Source abstract
Abstract
In this study, we have grown epitaxial wurtzite structured InAs nanosheets using Au catalysts on a GaAs{111}B substrate by molecular beam epitaxy. Through detailed electron microscopy characterization studies on grown nanosheets, it was found that these wurtzite structured InAs nanosheets grew epitaxially on the GaAs{111}B substrate, with {0001[combining macron]} catalyst/nanosheet interfaces and extensive {112[combining macron]0} surfaces. It was anticipated that the epitaxially grown InAs nanosheet can be triggered by a high supersaturation in catalysts, leading to an inclined growth leaving the substrate surface, and driven by the small lattice mismatch between the nanosheets and the substrate, with the orientation relationship of (0001[combining macron])InAs//(112[combining macron])GaAs. This study provides insights into achieving epitaxial free-standing III-V nanosheet growth.
Source: europepmc · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Nanowire Synthesis and Applications · Advancements in Semiconductor Devices and Circuit Design · Electronic and Structural Properties of Oxides
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Materials Engineering
The University of Queensland
St Lucia
Australia
State Key Laboratory for Infrared Physics
Shanghai Institute of Technical Physics
Chinese Academy of Sciences
Shanghai 200083
China
Institute of Microstructure and Properties of Advanced Materials
Beijing University of Technology
Beijing 100124
Centre for Microscopy and Microanalysis
Funding
Australian Research Council · National Basic Research Program of China · National Natural Science Foundation of China · Chinese Academy of Sciences
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