Enhancing the electroluminescence efficiency of Si NC/SiO 2 superlattice-based light-emitting diodes through hydrogen ion beam treatment
Source abstract
Abstract
This paper presents a novel method for enhancing the electroluminescence (EL) efficiency of ten-period silicon-rich oxide (SRO)/SiO2 superlattice-based light-emitting diodes (LEDs). A hydrogen ion beam (HIB) was used to irradiate each SRO layer of the superlattices to increase the interfacial roughness on the nanoscale and the density of the Si nanocrystals (Si NCs). Fowler-Nordheim (F-N) tunneling was the major mechanism for injecting the carriers into the Si NCs. The barrier height of the F-N tunneling was lowered by forming a nano-roughened interface and the nonradiative Pb centers were passivated through the HIB treatment. Additionally, the reflectance of the LEDs was lowered because of the nano-roughened interface. These factors considerably increased the slope efficiency of EL and the maximum output power of the LEDs. The lighting efficiency increased by an order of magnitude, and the turn-on voltage decreased considerably. This study established an efficient approach for obtaining bright Si NC/SiO2 superlattice-based LEDs.
Source: openalex_inverted_index · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices · Nanowire Synthesis and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Electrical Engineering
National Cheng Kung University
Tainan, Taiwan
References (57)
Show source-provided references
1. Canham · Appl. Phys. Lett. · 1990 · 57 · 104610.1063/1.103561 ↗
2. Cullis · Nature · 1991 · 353 · 33510.1038/353335a0 ↗
3. Pavesi · Nature · 2000 · 408 · 44010.1038/35044012 ↗
4. Fan · Science · 2012 · 335 · 44710.1126/science.1214383 ↗
5. Priolo · Nat. Nanotechnol. · 2014 · 9 · 1910.1038/nnano.2013.271 ↗
6. Park · Appl. Phys. Lett. · 2001 · 78 · 257510.1063/1.1367277 ↗
7. Walters · Nat. Mater. · 2005 · 4 · 14310.1038/nmat1307 ↗
8. Shieh · Appl. Phys. Lett. · 2007 · 90 · 05110510.1063/1.2450653 ↗
9. Luna-López · J. Vac. Sci. Technol., A · 2009 · 27 · 5710.1116/1.3032915 ↗
10. Hung-Yu · IEEE J. Sel. Top. Quantum Electron. · 2014 · 20 · 21810.1109/JSTQE.2013.2291701 ↗
11. S. V. Gaponenko , Optical Properties of Semiconductor Nanocrystals , Cambridge University Press , 199810.1017/CBO9780511524141 ↗
12. Palacios-Huerta · Nanotechnology · 2015 · 26 · 39520210.1088/0957-4484/26/39/395202 ↗
13. Cabañas-Tay · Semicond. Sci. Technol. · 2015 · 30 · 06500910.1088/0268-1242/30/6/065009 ↗
14. López-Vidrier · Nanotechnology · 2015 · 26 · 18570410.1088/0957-4484/26/18/185704 ↗
15. Lu · Nature · 1995 · 378 · 25810.1038/378258a0 ↗
16. Heng · J. Appl. Phys. · 2001 · 89 · 568210.1063/1.1338984 ↗
17. Anopchenko · Appl. Phys. Lett. · 2011 · 99 · 18110810.1063/1.3658625 ↗
18. Huh · Adv. Mater. · 2010 · 22 · 505810.1002/adma.201001572 ↗
19. Lin · Appl. Phys. Lett. · 2010 · 96 · 26351410.1063/1.3459144 ↗
20. Ding · Opt. Express · 2011 · 19 · 272910.1364/OE.19.002729 ↗
21. Di · Appl. Phys. Lett. · 2011 · 99 · 25111310.1063/1.3671671 ↗
22. Chen · Appl. Phys. Lett. · 2014 · 104 · 06110510.1063/1.4865207 ↗
23. Li · Sci. Rep. · 2015 · 5 · 1188110.1038/srep11881 ↗
24. Jia-Rong · Nanotechnology · 2014 · 25 · 35520310.1088/0957-4484/25/35/355203 ↗
25. Li · Nanoscale · 2013 · 5 · 343510.1039/c3nr33235g ↗
26. Maier-Flaig · Nano Lett. · 2013 · 13 · 47510.1021/nl3038689 ↗
27. Puzzo · Nano Lett. · 2011 · 11 · 158510.1021/nl1044583 ↗
28. Yang · Adv. Funct. Mater. · 2014 · 24 · 134510.1002/adfm.201302091 ↗
29. Wang · Appl. Phys. Lett. · 2013 · 102 · 08111410.1063/1.4794079 ↗
30. Huh · Appl. Phys. Lett. · 2015 · 106 · 21110310.1063/1.4921786 ↗
31. Puthen Veettil · Appl. Phys. Lett. · 2014 · 105 · 22210810.1063/1.4903776 ↗
32. Cheng · Opt. Express · 2013 · 21 · 39110.1364/OE.21.000391 ↗
33. Lin · J. Appl. Phys. · 2005 · 97 · 09430610.1063/1.1886274 ↗
34. Chen · Semicond. Sci. Technol. · 2008 · 23 · 01501310.1088/0268-1242/23/1/015013 ↗
35. Cheng · Nano Lett. · 2011 · 11 · 195210.1021/nl2001692 ↗
36. Liu · Opt. Express · 2011 · 19 · 334710.1364/OE.19.003347 ↗
37. Guo · Opt. Mater. Express · 2015 · 5 · 96910.1364/OME.5.000969 ↗
38. Huh · Appl. Phys. Lett. · 2014 · 105 · 03110810.1063/1.4890848 ↗
39. Shih · Opt. Express · 2013 · 21 · 1588810.1364/OE.21.015888 ↗
40. Zacharias · Phys. Rev. B: Condens. Matter · 2000 · 62 · 839110.1103/PhysRevB.62.8391 ↗
41. Zacharias · Appl. Phys. Lett. · 2002 · 80 · 66110.1063/1.1433906 ↗
42. Yang · Appl. Phys. Lett. · 2014 · 105 · 05311610.1063/1.4892658 ↗
43. Perrey · J. Non-Cryst. Solids · 2004 · 343 · 7810.1016/j.jnoncrysol.2004.06.013 ↗
44. Conibeer · Thin Solid Films · 2006 · 511–512 · 65410.1016/j.tsf.2005.12.119 ↗
45. Yurtsever · Appl. Phys. Lett. · 2006 · 89 · 15192010.1063/1.2360906 ↗
46. Fowler · Proc. R. Soc. London, Ser. A · 1928 · 119 · 17310.1098/rspa.1928.0091 ↗
47. Weinberg · J. Appl. Phys. · 1982 · 53 · 505210.1063/1.331336 ↗
48. D. K. Schroder , Semiconductor material and device characterization , John Wiley & Sons , 2006
49. Lin · Opt. Express · 2007 · 15 · 255510.1364/OE.15.002555 ↗
50. Ray · J. Phys. D: Appl. Phys. · 2013 · 46 · 15300110.1088/0022-3727/46/15/153001 ↗
51. Ghosh · Adv. Funct. Mater. · 2014 · 24 · 715110.1002/adfm.201401795 ↗
52. Wierer · Nat. Photonics · 2009 · 3 · 16310.1038/nphoton.2009.21 ↗
53. Hung-Wen · Nanotechnology · 2005 · 16 · 184410.1088/0957-4484/16/9/071 ↗
54. Lee · Adv. Funct. Mater. · 2012 · 22 · 322310.1002/adfm.201200572 ↗
55. Withrow · J. Appl. Phys. · 1999 · 86 · 39610.1063/1.370699 ↗
56. Garrido Fernandez · J. Appl. Phys. · 2002 · 91 · 79810.1063/1.1423768 ↗
57. Godefroo · Nat. Nanotechnol. · 2008 · 3 · 17410.1038/nnano.2008.7 ↗