journal article·2018

Rigorous analysis of Casimir and van der Waals forces on a silicon nano-optomechanical device actuated by optical forces

Janderson R. Rodrigues, Andre Gusso, Felipe S. S. Rosa, Vilson R. Almeida

Nanoscale· Volume 10· Issue 8
Publisher page

Abstract

Nano-optomechanical devices have enabled a lot of interesting scientific and technological applications. However, due to their nanoscale dimensions, they are vulnerable to the action of Casimir and van der Waals (dispersion) forces. This work presents a rigorous analysis of the dispersion forces on a nano-optomechanical device based on a silicon waveguide and a silicon dioxide substrate, surrounded by air and driven by optical forces. The dispersion forces are calculated using a modified Lifshitz theory with experimental optical data and validated by means of a rigorous 3D FDTD simulation. The mechanical nonlinearity of the nanowaveguide is taken into account and validated using a 3D FEM simulation. The results show that it is possible to attain a no pull-in critical point due to only the optical forces; however, the dispersion forces usually impose a pull-in critical point to the device and establish a minimal initial gap between the waveguide and the substrate. Furthermore, it is shown that the geometric nonlinearity effect may be exploited in order to avoid or minimize the pull-in and, therefore, the device collapse.
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Research context

OpenAlex topics: Mechanical and Optical Resonators · Quantum Electrodynamics and Casimir Effect · Advanced MEMS and NEMS Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Instituto Tecnológico de Aeronáutica

São José dos Campos

Brazil

Instituto de Estudos Avançados

Departamento de Ciências Exatas

Universidade Federal Fluminense

Volta Redonda

Instituto de Física

Universidade Federal do Rio de Janeiro

Rio de Janeiro

Funding

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior · Conselho Nacional de Desenvolvimento Científico e Tecnológico

References (50)

Show source-provided references
1. Aspelmeyer · Rev. Mod. Phys. · 2014 · 86 · 139110.1103/RevModPhys.86.1391 ↗
2. Metcalfe · Appl. Phys. Rev. · 2014 · 1 · 03110510.1063/1.4896029 ↗
3. Povinelli · Opt. Lett. · 2005 · 30 · 304210.1364/OL.30.003042 ↗
4. Eichenfield · Nat. Photonics · 2007 · 1 · 41610.1038/nphoton.2007.96 ↗
5. Li · Nature · 2008 · 456 · 48010.1038/nature07545 ↗
6. Li · Nat. Photonics · 2009 · 3 · 46410.1038/nphoton.2009.116 ↗
7. Roels · Nat. Nanotechnol. · 2009 · 4 · 51010.1038/nnano.2009.186 ↗
8. Wiederhecker · Nature · 2009 · 462 · 63310.1038/nature08584 ↗
9. van Thourhout · Nat. Photonics · 2010 · 4 · 21110.1038/nphoton.2010.72 ↗
10. Rodriguez · Ann. Phys. · 2015 · 527 · 4510.1002/andp.201400160 ↗
11. Serry · J. Microelectromech. Syst. · 1995 · 4 · 19310.1109/84.475546 ↗
12. Buks · Phys. Rev. B: Condens. Matter Mater. Phys. · 2001 · 63 · 03340210.1103/PhysRevB.63.033402 ↗
13. Lifshitz · Sov. Phys. – JETP · 1956 · 2 · 73
14. Dzyaloshinskii · Adv. Phys. · 1961 · 10 · 16510.1080/00018736100101281 ↗
15. Huttner · Phys. Rev. A · 1992 · 46 · 430610.1103/PhysRevA.46.4306 ↗
16. Matloob · Phys. Rev. A · 1995 · 52 · 482310.1103/PhysRevA.52.4823 ↗
17. Rosa · Phys. Rev. A · 2010 · 81 · 03381210.1103/PhysRevA.81.033812 ↗
18. Rosa · Phys. Rev. A · 2011 · 84 · 05381310.1103/PhysRevA.84.053813 ↗
19. López · Eur. Phys. J. C · 2015 · 75 · 9310.1140/epjc/s10052-015-3308-x ↗
20. Zou · Nat. Commun. · 2013 · 4 · 184510.1038/ncomms2842 ↗
21. Tang · Nat. Photonics · 2017 · 11 · 9710.1038/nphoton.2016.254 ↗
22. Pernice · Opt. Express · 2010 · 18 · 1261510.1364/OE.18.012615 ↗
23. Rodriguez · Appl. Phys. Lett. · 2011 · 98 · 19410510.1063/1.3589119 ↗
24. Zheng · Phys. Rev. A · 2014 · 89 · 04381010.1103/PhysRevA.89.043810 ↗
25. Rodrigues · IEEE Photonics Technol. Lett. · 2016 · 28 · 58910.1109/LPT.2015.2508808 ↗
26. Guizal · Phys. Rev. B: Condens. Matter Mater. Phys. · 2016 · 93 · 11542710.1103/PhysRevB.93.115427 ↗
27. Pernice · Opt. Express · 2009 · 17 · 180610.1364/OE.17.001806 ↗
28. Wang · Sci. Rep. · 2015 · 5 · 865710.1038/srep08657 ↗
29. Parsegian · J. Colloid Interface Sci. · 1971 · 37 · 33210.1016/0021-9797(71)90301-8 ↗
30. Raabe · Phys. Rev. A · 2003 · 68 · 03381010.1103/PhysRevA.68.033810 ↗
31. Lambrecht · EPL · 2007 · 77 · 4400610.1209/0295-5075/77/44006 ↗
32. Pirozhenko · Phys. Rev. A · 2008 · 77 · 01381110.1103/PhysRevA.77.013811 ↗
33. Casimir · Proc. K. Ned. Akad. Wet. · 1948 · 51 · 793
34. L. D. Landau and E. M.Lifshitz , in Statistical Physics , Pergamon , Oxford , 1969
35. Gusso · J. Phys. D: Appl. Phys. · 2008 · 41 · 17540510.1088/0022-3727/41/17/175405 ↗
36. S. Adachi , in Optical Constants of Crystalline and Amorphous Semiconductors , Kluwer Academic Publishers , Boston, MA , 1999
37. Ninham · Biophys. J. · 1970 · 10 · 64610.1016/S0006-3495(70)86326-3 ↗
38. Bergstrom · Adv. Colloid Interface Sci. · 1997 · 70 · 12510.1016/S0001-8686(97)00003-1 ↗
39. Tan · Phys. Rev. B: Condens. Matter Mater. Phys. · 2005 · 72 · 20511710.1103/PhysRevB.72.205117 ↗
40. Filatova · J. Phys.: Condens. Matter · 1999 · 11 · 3355
41. Rodriguez · Phys. Rev. Lett. · 2007 · 99 · 08040110.1103/PhysRevLett.99.080401 ↗
42. Rodriguez · Phys. Rev. A · 2009 · 80 · 01211510.1103/PhysRevA.80.012115 ↗
43. McCauley · Phys. Rev. A · 2010 · 81 · 01211910.1103/PhysRevA.81.012119 ↗
44. Riboli · Eur. Phys. J. D · 2008 · 46 · 15710.1140/epjd/e2007-00308-1 ↗
45. Rodrigues · Ann. Phys. · 2017 · 529 · 160019810.1002/andp.201600198 ↗
46. Rodrigues · Opt. Lett. · 2017 · 42 · 437110.1364/OL.42.004371 ↗
47. Messina · Phys. Rev. A · 2011 · 84 · 04210210.1103/PhysRevA.84.042102 ↗
48. R. Frisch-Fay , in Flexible bars , Butterworths , London , 1962
49. Legtenberg · J. Micromech. Microeng. · 1996 · 6 · 32010.1088/0960-1317/6/3/004 ↗
50. Gies · Phys. Rev. Lett. · 2006 · 96 · 22040110.1103/PhysRevLett.96.220401 ↗