journal article·2022Open access

Low-temperature characteristics of magnesium fluoride based bipolar RRAM devices

Nayan C. Das, Minjae Kim, Jarnardhanan R. Rani, Sung-Min Hong, Jae-Hyung Jang

Nanoscale· Volume 14· Issue 10

Abstract

This study investigates the temperature-independent switching characteristics of magnesium fluoride (MgFx) based bipolar resistive memory devices at temperatures ranging from 300 K down to 77 K. Filament type resistive switching at the interface of Ti/MgFx and the trap-controlled space charge limited conduction (SCLC) mechanism in the bulk MgFx layer are confirmed. The experimental results indicate that the operating environment and temperature critically control the resistive switching performance by varying the non-stoichiometry of the amorphous MgFx active layer and Ti/MgFx interface region. The gaseous atmosphere (open air or vacuum) affects device performances such as the electroforming process, on-state current, off-state current, on/off ratio, SET/RESET voltage and endurance of resistive-switching memory devices. After electroforming, the device performance is independent of temperature variation. The Ti/MgFx/Pt memory devices show promising data retention for >104 s in a vacuum at room temperature and 77 K with the DC endurance property for more than 150 cycles at 77 K. The devices have great potential for future temperature-independent electronic applications.
Source: europepmc · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju, 61005, South Korea

School of Energy Engineering, Korea Institute of Energy Technology, Naju 58330, South Korea

Funding

National Research Foundation of Korea · Samsung

References (63)

Show source-provided references
1. Cryogenic Memory - Rambus, https://www.rambus.com/emerging-solutions/cryogenic-memory/
2. Fang · IEEE Electron Device Lett. · 2015 · 36 · 56710.1109/LED.2015.2420665 ↗
3. Chen · IEEE Electron Device Lett. · 2017 · 38 · 124410.1109/LED.2017.2734743 ↗
4. Nagashima · Nano Lett. · 2012 · 12 · 568410.1021/nl302880a ↗
5. Goux · Appl. Phys. Lett. · 2010 · 97 · 24350910.1063/1.3527086 ↗
6. Chen · Materials · 2018 · 11 · 4310.3390/ma11010043 ↗
7. Wang · Nat. Commun. · 2014 · 5 · 1
8. Walczyk · IEEE Trans. Electron Devices · 2011 · 58 · 312410.1109/TED.2011.2160265 ↗
9. C.Ahn , S.Kim , T.Gokmen , O.Dial , M.Ritter and H. S. P.Wong , Proc. Tech. Progr. - 2014 Int. Symp. VLSI Technol. Syst. Appl. VLSI-TSA 2014 , 2014 , pp. 1–2
10. Shang · Adv. Funct. Mater. · 2014 · 24 · 217110.1002/adfm.201303274 ↗
11. Zhou · IEEE Trans. Nanotechnol. · 2012 · 11 · 105910.1109/TNANO.2012.2212453 ↗
12. Tsuruoka · Adv. Funct. Mater. · 2012 · 22 · 7010.1002/adfm.201101846 ↗
13. Valov · J. Phys. D: Appl. Phys. · 2018 · 51 · 41300110.1088/1361-6463/aad581 ↗
14. Tappertzhofen · Mater. Res. Soc. Symp. Proc. · 2011 · 133010.1557/opl.2011.1198 ↗
15. Tappertzhofen · ACS Nano · 2013 · 7 · 639610.1021/nn4026614 ↗
16. Lübben · Adv. Electron. Mater. · 2018 · 4 · 110.1002/aelm.201700458 ↗
17. Yu · Appl. Phys. Lett. · 2011 · 99 · 16
18. Zhang · Nanoscale · 2016 · 8 · 1504810.1039/C6NR03913H ↗
19. Sun · AIP Adv. · 2019 · 9 · 10511710.1063/1.5125153 ↗
20. Das · Micromachines · 2021 · 12 · 104910.3390/mi12091049 ↗
21. Lim · Electronics · 2015 · 4 · 58610.3390/electronics4030586 ↗
22. Yang · Trans. Electr. Electron. Mater. · 2010 · 11 · 3310.4313/TEEM.2010.11.1.033 ↗
23. Pilvi · J. Mater. Chem. · 2007 · 17 · 507710.1039/b710903b ↗
24. Wuttke · J. Phys. Chem. C · 2010 · 114 · 511310.1021/jp911584h ↗
25. Dumas · J. Vac. Sci. Technol., A · 2000 · 18 · 46510.1116/1.582210 ↗
26. Selvam · J. Alloys Compd. · 2011 · 509 · 980910.1016/j.jallcom.2011.08.032 ↗
27. Kinosita · J. Vac. Sci. Technol. · 1969 · 6 · 73010.1116/1.1315743 ↗
28. Sealy · Thin Solid Films · 1972 · 11 · 36510.1016/0040-6090(72)90062-4 ↗
29. Gao · IEEE Electron Device Lett. · 2020 · 41 · 3810.1109/LED.2019.2953306 ↗
30. Bagdzevicius · J. Electroceram. · 2017 · 39 · 15710.1007/s10832-017-0087-9 ↗
31. Lübben · Adv. Electron. Mater. · 2018 · 4 · 110.1002/aelm.201700458 ↗
32. Zahoor · Nanoscale Res. Lett. · 2020 · 1510.1186/s11671-020-03299-9 ↗
33. K.Santosh , in Nanoscale Semiconductor Memories , CRC Press , 2017
34. Ielmini · J. Appl. Phys. · 2011 · 109 · 03450610.1063/1.3544499 ↗
35. Lu · Nanoscale · 2016 · 8 · 1811310.1039/C6NR06427B ↗
36. Song · IEEE Electron Device Lett. · 2011 · 32 · 143910.1109/LED.2011.2162055 ↗
37. Lu · Nanoscale · 2017 · 9 · 1269010.1039/C7NR02915B ↗
38. Traore · IEEE Trans. Electron Devices · 2018 · 65 · 50710.1109/TED.2017.2785352 ↗
39. Chen · Nanoscale Res. Lett. · 2014 · 9 · 110.1186/1556-276X-9-1 ↗
40. Wang · Comput. Mater. Sci. · 2013 · 77 · 28110.1016/j.commatsci.2013.04.031 ↗
41. Simanjuntak · Nanoscale Res. Lett. · 2016 · 1110.1186/s11671-016-1570-y ↗
42. Janousch · Adv. Mater. · 2007 · 19 · 223210.1002/adma.200602915 ↗
43. Schindler · Appl. Phys. Lett. · 2009 · 94 · 200710.1063/1.3077310 ↗
44. Inoue · Phys. Rev. B: Condens. Matter Mater. Phys. · 2008 · 77 · 1
45. Zhang · Indian J. Eng. Mater. Sci. · 2014 · 21 · 563
46. Yang · New J. Phys. · 2010 · 12 · 02300810.1088/1367-2630/12/2/023008 ↗
47. Yang · Nat. Nanotechnol. · 2008 · 3 · 42910.1038/nnano.2008.160 ↗
48. Onofrio · Nat. Mater. · 2015 · 14 · 44010.1038/nmat4221 ↗
49. Jung · Appl. Phys. Lett. · 2007 · 90 · 1
50. Uenuma · Appl. Phys. Lett. · 2015 · 107 · 07350310.1063/1.4928661 ↗
51. A. B.Chen , Doctoral dissertation , University of Pennsylvania , 2011
52. Pérez · J. Vac. Sci. Technol., B: Nanotechnol. Microelectron.: Mater., Process., Meas., Phenom. · 2017 · 35 · 01A103
53. Sundqvist · J. Phys. Chem. Solids · 2018 · 122 · 4110.1016/j.jpcs.2018.05.046 ↗
54. G.Dyos , The Handbook of Electrical Resistivity The Handbook of Electrical Resistivity , 2012
55. White · Philos. Trans. R. Soc. London, Ser. A · 1959 · 25110.1098/rsta.1959.0004 ↗
56. Chiu · Adv. Mater. Sci. Eng. · 2014 · 2014 · 578168
57. Li · Chin. Sci. Bull. · 2011 · 56 · 307210.1007/s11434-011-4671-0 ↗
58. Chiu · J. Appl. Phys. · 2005 · 97 · 10350310.1063/1.1896435 ↗
59. Das · Appl. Sci. · 2020 · 10 · 350610.3390/app10103506 ↗
60. Park · J. Phys. Chem. Solids · 1976 · 37 · 60710.1016/0022-3697(76)90110-4 ↗
61. Field · IEEE Trans. Electron Devices · 2011 · 58 · 110.1109/TED.2011.2160325 ↗
62. Yuan · Nanoscale Res. Lett. · 2014 · 9 · 110.1186/1556-276X-9-1 ↗
63. Lin · J. Appl. Phys. · 2007 · 102 · 09410110.1063/1.2802990 ↗