Advancements of Evactron® Plasma Cleaning of Moxtek® X-ray Windows
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Abstract
Journal Article Advancements of Evactron® Plasma Cleaning of Moxtek® X-ray Windows Get access Ewa Kosmowska, Ewa Kosmowska XEI Scientific, Inc., Redwood City, CA, USA Corresponding author: ewa@evactron.com Search for other works by this author on: Oxford Academic Google Scholar Michael Almond, Michael Almond Moxtek Inc., Orem, UT, USA Search for other works by this author on: Oxford Academic Google Scholar Josh Wong, Josh Wong Moxtek Inc., Orem, UT, USA Search for other works by this author on: Oxford Academic Google Scholar Brian Law, Brian Law Moxtek Inc., Orem, UT, USA Search for other works by this author on: Oxford Academic Google Scholar Barbara Armbruster, Barbara Armbruster XEI Scientific, Inc., Redwood City, CA, USA Search for other works by this author on: Oxford Academic Google Scholar Ronald Vane Ronald Vane XEI Scientific, Inc., Redwood City, CA, USA Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 25, Issue S2, 1 August 2019, Pages 556–557, https://doi.org/10.1017/S1431927619003519 Published: 01 August 2019
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Research context
OpenAlex topics: Fusion materials and technologies · Semiconductor materials and devices · Plasma Diagnostics and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (4)
Show source-provided references
1. 10.1017/S143192761400738710.1017/S1431927614007387 ↗
2. 10.1017/S143192760488381810.1017/S1431927604883818 ↗
3. 10.1017/S143192761700105210.1017/S1431927617001052 ↗
4. 10.1017/S143192761800390210.1017/S1431927618003902 ↗