Focused Ion Beams of Xe+, Ar+, O+, and N+: Sputter Rate Trends, Chemical Interactions, and Emerging Applications
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Abstract
Journal Article Focused Ion Beams of Xe+, Ar+, O+, and N+: Sputter Rate Trends, Chemical Interactions, and Emerging Applications Get access Chad Rue, Chad Rue ThermoFisher Scientific, Advanced Technology Division, Hillsboro, OR, USA Corresponding author: chad.rue@thermofisher.com Search for other works by this author on: Oxford Academic Google Scholar Jing Wang, Jing Wang ThermoFisher Scientific, Advanced Technology Division, Hillsboro, OR, USA Search for other works by this author on: Oxford Academic Google Scholar Steven Randolph, Steven Randolph ThermoFisher Scientific, Advanced Technology Division, Hillsboro, OR, USA Search for other works by this author on: Oxford Academic Google Scholar Gavin Mitchson Gavin Mitchson ThermoFisher Scientific, Advanced Technology Division, Hillsboro, OR, USA Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 25, Issue S2, 1 August 2019, Pages 860–861, https://doi.org/10.1017/S1431927619005038 Published: 01 August 2019
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Ion-surface interactions and analysis · Electron and X-Ray Spectroscopy Techniques · Advanced Electron Microscopy Techniques and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (4)
Show source-provided references
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4. C Rue , Cold Beams Conference, Eindhoven, Netherlands (2017).