Image Simulation and Analysis to Predict the Sensitivity Performance of a Multi-Electron Beam Critical Dimension Metrology Tool
Source abstract
Abstract
Maseeh Mukhtar, Brad Thiel; Image Simulation and Analysis to Predict the Sensitivity Performance of a Multi-Electron Beam Critical Dimension Metrology Tool
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Electron and X-Ray Spectroscopy Techniques · Advancements in Photolithography Techniques · Welding Techniques and Residual Stresses
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References (3)
Show source-provided references
1. 10.1017/S143192761600395010.1017/S1431927616003950 ↗
2. 10.1117/1.JMM.15.3.03400410.1117/1.JMM.15.3.034004 ↗
3. Bunday B. “HVM Metrology Challenges towards the 5 nm Node”, Metrology, Inspection, and Process Control for Microlithography XXX, Proc. SPIE 9778.10.1117/12.2218375 ↗