Progress in a New Method of Thickness Measurement by X-ray Analysis in TEM
Source abstract
Abstract
J Sagar, P Statham, J Holland, P Pinard, S Lozano-Perez; Progress in a New Method of Thickness Measurement by X-ray Analysis in TEM, Microscopy and Microan
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Electron and X-Ray Spectroscopy Techniques · Advancements in Photolithography Techniques · Silicon Carbide Semiconductor Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (5)
Show source-provided references
1. 10.1002/jemt.106008020610.1002/jemt.1060080206 ↗
2. 10.1017/S143192761600104510.1017/S1431927616001045 ↗
3. 10.1017/S143192761300736810.1017/S1431927613007368 ↗
4. 10.1103/PhysRevB.77.10410210.1103/PhysRevB.77.104102 ↗
5. 10.1017/S143192761400095610.1017/S1431927614000956 ↗