Minimize Electron Beam Damage during Characterization of Carbon-Depletion in Ultra Low-K Dielectric Materials by STEM EELS Elemental Mapping
Source abstract
Abstract
Wayne W Zhao, Michael Gribelyuk; Minimize Electron Beam Damage during Characterization of Carbon-Depletion in Ultra Low-K Dielectric Materials by STEM EELS
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Semiconductor materials and devices · Copper Interconnects and Reliability · Semiconductor materials and interfaces
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (6)
Show source-provided references
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5. 10.1051/mmm:0199100202-302310010.1051/mmm:0199100202-3023100 ↗
6. 10.1063/1.156746010.1063/1.1567460 ↗