Use of Single Crystal Masks for Improved Mill Characteristics in High Current Xenon Plasma FIB instrumentation
Source abstract
Abstract
Srinivas Subramaniam, Linda Smath, Adriane Brown, Kevin Johnson; Use of Single Crystal Masks for Improved Mill Characteristics in High Current Xenon Plasma
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Force Microscopy Techniques and Applications · Integrated Circuits and Semiconductor Failure Analysis · Electronic and Structural Properties of Oxides
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References (3)
Show source-provided references
1. 10.1557/JMR.1999.064110.1557/JMR.1999.0641 ↗
2. Microscopy and Microanalysis · 2014 · 296
3. Microscopy and Microanalysis · 2015 · 1841