A Method for Site-specific Specimen Preparation of Si Device after 65 nm-node Technology using FIB-STEM/TEM System
Source abstract
Abstract
Extended abstract of a paper presented at Microscopy and Microanalysis 2007 in Ft. Lauderdale, Florida, USA, August 5 – August 9, 2007
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Silicon and Solar Cell Technologies · Advanced Surface Polishing Techniques
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References
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