journal article·2005-12

AFM Studies of Ni Electrodeposits on GaAs

V. C. Zoldan, D. M. Kirkwood, G. Zangari, M. L. Munford, W. Figueiredo, A. A. Pasa

Microscopy and Microanalysis· Volume 11· Issue S03
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Abstract

In this study, the surface morphology of electrodeposited Ni on single crystal GaAs (001) was investigated by atomic force microscopy (AFM). The images show granular deposits with stepped contours typical of single-crystalline grains. The correlation length correlates very well with the size of the grains, indicating that the layers grow as columns with diameter increasing with thickness. This growth mechanism is observed for layers with thicknesses in the range of 10 to 500 nm at a deposition rate of ~0.5 nm/s.
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Research context

OpenAlex topics: Electrodeposition and Electroless Coatings · Semiconductor materials and interfaces · Metal and Thin Film Mechanics

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