journal article·2009-07

In-situ Low Energy Argon Ion Milling of Nanoelectronic Structures Using a Triple Beam System

H Stegmann, Y Ritz, D Utess, H-J Engelmann, E Zschech

Microscopy and Microanalysis· Volume 15· Issue S2
Publisher page

Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2009 in Richmond, Virginia, USA, July 26 – July 30, 2009
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short

Research context

OpenAlex topics: Ion-surface interactions and analysis · Electron and X-Ray Spectroscopy Techniques · Integrated Circuits and Semiconductor Failure Analysis

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References

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