DataVXMicroscopy and MicroanalysisPaper
journal article·2013-08Open access

The Effect of High Temperature Annealing on the Grain Characteristics of a Thin Chemical Vapor Deposition Silicon Carbide Layer

I.J. van Rooyen, P.M. van Rooyen, M.L. Dunzik-Gougar

Microscopy and Microanalysis· Volume 19· Issue S2
Publisher pageOpen full text
Source abstract

Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2013 in Indianapolis, Indiana, USA, August 4 – August 8, 2013.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short

Research context

Materials processing

OpenAlex topics: Metal and Thin Film Mechanics · Ion-surface interactions and analysis · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References

Reference metadata was not supplied for this record.