Characterization with TEM of AlN/GaN Heterostructures for Implant Activation Annealing
Source abstract
Abstract
Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short
Research context
OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis
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References
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