Effect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films
Source abstract
Abstract
SK Nandi, D J Llewellyn, K Belay, DK Venkatachalam, X Liu, RG Elliman; Effect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films, Microscopy
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Semiconductor materials and devices · Advancements in Semiconductor Devices and Circuit Design · Ferroelectric and Negative Capacitance Devices
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References
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