journal article·2003-09

State of the First Aberration-Corrected, Monochromized 200kV FEG-TEM

Gerd Benner, Marko Matijevic, Alexander Orchowski, Bernd Schindler, Max Haider, Peter Hartel

Microscopy and Microanalysis· Volume 9· Issue S03
Publisher page

Abstract

Journal Article State of the First Aberration-Corrected, Monochromized 200kV FEG-TEM Get access Gerd Benner, Gerd Benner Search for other works by this author on: Oxford Academic Google Scholar Marko Matijevic, Marko Matijevic Search for other works by this author on: Oxford Academic Google Scholar Alexander Orchowski, Alexander Orchowski Corresponding author: Orchowski@leo.de Search for other works by this author on: Oxford Academic Google Scholar Bernd Schindler, Bernd Schindler LEO Elektronenmikroskopie GmbH, Carl Zeiss S-M-T AG, D-73447 Oberkochen, Germany Search for other works by this author on: Oxford Academic Google Scholar Max Haider, Max Haider Search for other works by this author on: Oxford Academic Google Scholar Peter Hartel Peter Hartel CEOS GmbH, Englerstr. 28, D-69126 Heidelberg, Germany Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 9, Issue S03, 1 September 2003, Pages 38–39, https://doi.org/10.1017/S1431927603012005 Published: 05 September 2003
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Research context

OpenAlex topics: Advanced Electron Microscopy Techniques and Applications · Electron and X-Ray Spectroscopy Techniques · Advanced X-ray Imaging Techniques

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References

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