Observation of Ultra-Thin Polar Domains in La-doped HfO2
Abstract
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Research context
OpenAlex topics: Ferroelectric and Negative Capacitance Devices · Semiconductor materials and devices · Electronic and Structural Properties of Oxides
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Affiliations
Institute of Materials Science and Engineering, Washington University in St. Louis , St. Louis, MO , USA
Department of Physics and Astronomy, University of Nebraska , Lincoln, NE , USA
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory , Oak Ridge, TN , USA
Nebraska Center for Materials and Nanoscience, University of Nebraska , Lincoln, NE , USA
Department of Mechanical Engineering and Material Science, Washington University in St. Louis , St. Louis, MO , USA