Nanobeam Diffraction and Geometric Phase Analysis for Strain Measurements in Si/SiGe Nanosheet Structures
Source abstract
Abstract
J Li, S Reboh, Robin Chao, N Loubet, M Guillorn, T Yamashita, J Gaudiello; Nanobeam Diffraction and Geometric Phase Analysis for Strain Measurements in Si/
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Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Advanced Surface Polishing Techniques · Semiconductor materials and interfaces
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References (1)
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1. IEDM · 2003 · 1161