Multivariate Statistical Analysis of Low-voltage EDS Spectrum Images
Source abstract
Abstract
Abstract Whereas energy-dispersive X-ray spectrometry (EDS) has been used for compositional analysis in the scanning electron microscope (SEM) for 30 years, the benefits of using low (<5 kV) operating voltages for such analyses have been explored only during the last few years. This paper couples low-voltage EDS with two other emerging areas of characterization: spectrum imaging and multivariate statistical analysis (MSA). The specimen analyzed for this study was a finished Intel Pentium processor, with the polyimide protective coating stripped o ff to expose the final active layers. Data acquisition was performed with a Philips XL30-FEG SEM operated at 2 kV and equipped with an Oxford super-ATW detector and XP3 pulse processor. The specimen was normal to the electron beam and the take-off angle for acquisition was 35°. The microscope was operated with a 150 μm diameter final aperture at spot size 6, which yielded an X-ray count rate of ∼1000 s-1.
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Research context
OpenAlex topics: Non-Destructive Testing Techniques · Industrial Vision Systems and Defect Detection · Ultrasonics and Acoustic Wave Propagation
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Affiliations
Metals & Ceramics Division, Oak Ridge National Laboratory , PO Box 2008, Oak Ridge, TN, 37831-6376
References (7)
Show source-provided references
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7. >Research at the Oak Ridge National Laboratory (ORNL) SHaRE User Facility was sponsored by the Division of Materials Sciences, U.S. Department of Energy, under contract DE-AC05-96OR22464 with Lockheed Martin Energy Research Corporation. The author thanks David Susnitzky of Intel for furnishing the specimen and Jim Bentley of ORNL for helpful discussions about the data acquisition.