Using a Residual Gas Analyzer to Monitor Plasma Cleaning of SEM Chambers and Specimens
Source abstract
Abstract
Ronald Vane, Michael Cable; Using a Residual Gas Analyzer to Monitor Plasma Cleaning of SEM Chambers and Specimens, Microscopy and Microanalysis, Volume 24
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Electron and X-Ray Spectroscopy Techniques · Advanced Materials Characterization Techniques · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (2)
Show source-provided references
1. 10.1017/S143192761700105210.1017/S1431927617001052 ↗
2. 10.1134/S106378500908005710.1134/S1063785009080057 ↗