In-situ Calibration for Angle-resolved Valence EELS
Source abstract
Abstract
M Malac, M Hayashida, H Müller, Y Taniguchi, RF Egerton; In-situ Calibration for Angle-resolved Valence EELS, Microscopy and Microanalysis, Volume 28, Issu
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Semiconductor materials and devices · Electronic and Structural Properties of Oxides · Electron and X-Ray Spectroscopy Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
NRC-NANO , Edmonton, Canada
University of Alberta Department of Physics, , Edmonton, Canada
CEOS GmbH , Englerstr. 28, D-69126 Heidelberg, Germany
Hitachi High-Tech Corp. , Hitachinaka-shi, 882 Ichige, Ibaraki-ken, Japan
References (5)
Show source-provided references
1. Stöger-Pollach · Micron · 2008 · 39 · 109210.1016/j.micron.2008.01.023 ↗
2. Midgley · Ultramicroscopy · 1999 · 76 · 9110.1016/S0304-3991(98)00088-6 ↗
3. Shekhar et · Optica · 2018 · 12 · 159010.1364/OPTICA.5.001590 ↗
4. Kahl · Adv. Imaging and Electron Physics · 2019 · 212 · 3510.1016/bs.aiep.2019.08.005 ↗
5. Pitarke · Rep. Prog. Phys · 2007 · 70 · 110.1088/0034-4885/70/1/R01 ↗