Application of STEM EELS Quantification Relative Compositional Ratio Mapping to Characterize SiCOH - Ultra Low-k Dielectric Materials in Si-based Devices
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Abstract
Wayne W Zhao, Michael Gribelyuk; Application of STEM EELS Quantification Relative Compositional Ratio Mapping to Characterize SiCOH - Ultra Low-k Dielectri
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Electron and X-Ray Spectroscopy Techniques · Surface and Thin Film Phenomena · Scientific Research and Discoveries
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (4)
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1. Microscopy & Microanalysis · 2013 · 19 · 90210.1017/S1431927613006508 ↗
2. 10.1051/mmm:0199100202-302310010.1051/mmm:0199100202-3023100 ↗
3. Microscopy & Microanalysis · 2015 · 21 · 1036
4. 10.1017/S143192761400353510.1017/S1431927614003535 ↗