4D-STEM of Beam-Sensitive Materials
Source abstract
Abstract
Karen C Bustillo, Steven E Zeltmann, Benjamin H Savitzky, Jim Ciston, Rohan Dhall, Peter Ercius, Colin Ophus, Andrew M Minor; 4D-STEM of Beam-Sensitive Mat
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Advanced Electron Microscopy Techniques and Applications · Electron and X-Ray Spectroscopy Techniques · Integrated Circuits and Semiconductor Failure Analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
National Center for Electron Microscopy , Molecular Foundry, Lawrence Berkeley National Lab, Berkeley, CA, USA
University of California Department of Materials Science and Engineering, , Berkeley, CA, USA
References (7)
Show source-provided references
1. Ophus · Microscopy and Microanalysis · 2019 · 25 · 56310.1017/S1431927619000497 ↗
2. Bustillo · Accounts of Chemical Research · 2021 · 54 · 254310.1021/acs.accounts.1c00073 ↗
3. Egerton · Micron · 2019 · 119 · 7210.1016/j.micron.2019.01.005 ↗
4. Gallagher-Jones · International Union of Crystallography Journal · 2020 · 7 · 49010.1107/S2052252520004030 ↗
5. Panova · Nature Materials · 2019 · 18 · 86010.1038/s41563-019-0387-3 ↗
6. Jiang · Soft Matter · 2019 · 15 · 472310.1039/C9SN00633H ↗
7. Donohue · iScience · 202210.1016/j.isci.2022.103882 ↗