Xe Plasma vs Gallium FIB Delayering
Source abstract
Abstract
S Sharang, Paul Anzalone, Jozef Vincenc Obona; Xe Plasma vs Gallium FIB Delayering, Microscopy and Microanalysis, Volume 25, Issue S2, 1 August 2019, Pages
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Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Advanced Electron Microscopy Techniques and Applications · Ion-surface interactions and analysis
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References (5)
Show source-provided references
1. Alvis · 41st ISTFA Conf. Proc · 2015
2. Carleson · 40th ISTFA Conf. Proc · 2014
3. Oboňa · EU. Micro. Cong. Proc · 2016
4. The authors would like to acknowledge funding support from the Technological Agency of the Czech Republic TE 01020233 (AmiSpec) and also Brenda Prenitzer Ph.D., from Nanospective, Orlando, Florida USA for providing 14nm technology samples for the delayering process.
5. Sharang · 2017