Electron Energy-Loss Spectroscopy (EELS) Study of NbOx Film for Resistive Memory Applications

Jiaming Zhang; Kate Norris; Katy Samuels; Ning Ge; Max Zhang; Joonsuk Park; Robert Sinclair; Gary Gibson; J. Joshua Yang; Zhiyong Li; R. Stanley Williams

doi:10.1017/s1431927615002226

journal article·2015-08Open access

Electron Energy-Loss Spectroscopy (EELS) Study of NbOx Film for Resistive Memory Applications

Jiaming Zhang, Kate Norris, Katy Samuels, Ning Ge, Max Zhang, Joonsuk Park, Robert Sinclair, Gary Gibson, J. Joshua Yang, Zhiyong Li, R. Stanley Williams

Microscopy and Microanalysis· Volume 21· Issue S3

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Abstract

Jiaming Zhang, Kate Norris, Katy Samuels, Ning Ge, Max Zhang, Joonsuk Park, Robert Sinclair, Gary Gibson, J Joshua Yang, Zhiyong Li, R Stanley Williams; El

Only a short abstract or summary was supplied by the source.

Source: openalex_inverted_index · Quality: short

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OpenAlex topics: Advanced Memory and Neural Computing · Semiconductor materials and devices · Transition Metal Oxide Nanomaterials

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References (4)

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